Abatchev, Mirzafer (Boise, ID, US)
Sandhu, Gurtej (Boise, ID, US)

Plaque It!

11/134982

09/30/2008

05/23/2005

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MICRON Technology, Inc. (Boise, ID, US)

438/709

438/597, 438/725

H01L21/302; H01L21/461

430/313, 438/709, 438/424, 438/725, 438/944, 430/311, 438/950, 430/5, 257/E21.038, 438/597, 438/430, 438/427, 438/942, 257/E21.039

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Le X, Thao

Jones, Eric W.

Knobbe Martens Olson & Bear, LLP

We Claim:

1. A method of forming isolated features in an integrated circuit comprising: providing a substrate overlaid by multiple layers of masking material; creating a first series of selectively definable lines in a first layer of masking material; reducing the pitch of the first series of selectively definable lines using a spacer material to create a first arrangement of masking features having a smaller pitch than the first series of selectively definable lines, the first arrangement of masking features comprising pitch-reduced masking lines separated by pitch-reduced spaces, the first arrangement corresponding to a first pattern; creating a second series of selectively definable lines in a second layer of masking material, the second series of selectively definable lines not parallel to the first series of selectively definable lines; reducing the pitch of the second series of selectively definable lines using a spacer material to create a second arrangement of masking features having a smaller pitch than the second series of selectively definable lines, the second arrangement of masking features comprising pitch-reduced masking lines separated by pitch-reduced spaces, the second arrangement corresponding to a second pattern; etching the substrate in a third pattern derived by superimposing the first and second patterns to create isolated features comprising holes; filling the holes with conductive material until the conductive material overflows; and etching the overflow of conductive material with chemical mechanical planarization to create isolated contacts.

2. The method of claim 1, wherein the third pattern has been transferred to a distinct layer before the third pattern is etched into the substrate.

3. The method of claim 2, wherein the distinct layer is formed from amorphous carbon.

4. The method of claim 1, wherein the selectively definable lines are formed from photoresist.

5. The method of claim 1, wherein the lines in the second series of selectively definable lines are perpendicular to the lines in the first series of selectively definable lines.

6. The method of claim 1, wherein the pitch of the first series of selectively definable lines is reduced before the second series of selectively definable lines is formed.

7. The method of claim 1, wherein the second arrangement of masking features overlies the first arrangement of masking features, each of the first and second arrangements of masking features has portions that are formed from a common material, a first underlying layer is also formed from the common material, a second underlying layer lies below the first underlying layer, and wherein the method further comprises etching exposed portions of the common material from both first and second arrangements of masking features at the same time.

8. The method of claim 7, wherein subsequent to the steps of claim 7, exposed portions of the common material from the first underlying layer and the second arrangement of masking features are etched at the same time to expose isolated portions of the second underlying layer.

9. The method of claim 8, wherein subsequent to the steps of claim 8, the third pattern is extended into the second underlying layer by selectively etching the exposed isolated portions of the second underlying layer to create holes in the second underlying layer.

10. The method of claim 9, wherein the common material is an oxide.

11. The method of claim 9, wherein the common material is silicon dioxide.

12. The method of claim 9, wherein the second underlying layer is amorphous carbon.

13. The method of claim 1, wherein selectively definable lines in the first series of selectively definable lines are reduced in width before the spacer material is applied.

14. The method of claim 1, wherein the first series of selectively definable lines is transferred to an underlying layer of masking material before the spacer material is applied.

15. The method of claim 14, wherein the selectively definable lines in the first series of selectively definable lines are reduced in width before being transferred to an underlying layer of masking material.

16. The method of claim 1, wherein selectively definable lines in the second series of selectively definable lines are reduced in width before the spacer material is applied.

17. The method of claim 1, wherein the second series of selectively definable lines is transferred to an underlying layer of masking material before the spacer material is applied.

18. The method of claim 17, wherein the selectively definable lines in the second series of selectively definable lines are reduced in width before being transferred to an underlying layer of masking material.

19. The method of claim 1, wherein selectively definable lines in the first and second series of selectively definable lines are reduced in width before the spacer materials are applied.

20. The method of claim 1, wherein the first and second series of selectively definable lines are each transferred to an underlying layer of making material before the spacer materials are applied.

21. The method of claim 20, wherein the selectively definable lines in the first series of selectively definable lines are reduced in width before being transferred to an underlying layer of masking material, and the selectively definable lines in the second series of selectively definable lines are also reduced in width before being transferred to an underlying layer of masking material.

22. A method of forming isolated features in an integrated circuit comprising: providing a substrate overlaid by multiple layers of masking material; creating a first series of selectively definable lines in a first layer of masking material; reducing the pitch of the first series of selectively definable lines using a spacer material to create a first arrangement of masking features having a smaller pitch than the first series of selectively definable lines, the first arrangement of masking features comprising pitch-reduced masking lines separated by pitch-reduced spaces, the first arrangement corresponding to a first pattern; creating a second series of selectively definable lines in a second layer of masking material, the second series of selectively definable lines not parallel to the first series of selectively definable lines; reducing the pitch of the second series of selectively definable lines using a spacer material to create a second of arrangement of masking features having a smaller pitch than the second series selectively definable lines, the second arrangement of masking features comprising pitch-reduce masking lines separated by pitch-reduced spaces, the second arrangement corresponding to a second pattern; and etching the substrate in a third pattern derived by superimposing the first and second patterns to create isolated features, wherein the isolated features comprises pillars.

23. The method of claim 22, wherein the second arrangement of masking features overlies the first arrangement of masking features, each of the first and second arrangements of masking features has portions that are formed from a common material, and an underlying layer is also formed from the common material, wherein the method further comprises removing those portions of the first arrangement of masking features that are not formed from the common material and that are not masked by the common material.

24. The method of claim 23, wherein subsequent to the steps of claim 23, exposed portions of the common material from the underlying layer and both first and second arrangements of masking features are etched at the same time, exposing masking islands that are not formed from the common material, the masking islands corresponding to the third pattern.

25. The method of claim 24, wherein the portions of the common material that are not masked by the masking islands are removed to leave behind masking islands that are not formed from the common material.

26. The method of claim 25, wherein the common material is an oxide.

27. The method of claim 25, wherein the common material is silicon dioxide.

28. The method of claim 22, wherein the second arrangement of masking features overlies the first arrangement of masking features, each of the first and second arrangements of masking features has portions that are formed from a common material, and an underlying layer is also formed from the common material, wherein the method further comprises removing portions of all exposed materials.

29. The method of claim 28, wherein subsequent to the steps of claim 28, the second pattern is extended through the first arrangement of masking materials and into at least one underlying layer.

30. The method of claim 29, wherein the method further comprises removing exposed portions of the common material to leave behind masking islands that are not formed from the common material, the masking islands corresponding to the third pattern.

31. The method of claim 30, wherein the method further comprises extending the pattern of masking islands into an underlying layer to create pillars.

32. The method of claim 22, wherein the pillars are formed from a conductive material.

33. The method of claim 32, wherein the pillars are formed within an inter-level dielectric and a chemical-mechanical process is used to remove excess material and isolate the features.

34. The method of claim 22, wherein the pillars are formed from a semiconductor.

35. The method of claim 34, wherein the pillars form vertical surround gate transistors.

36. A method of forming features in an array, the method comprising: reducing the pitch of a column of first photodefinable lines to form a column pattern; reducing the pitch of a row of second photodefinable lines to form a row pattern that crosses the column pattern, the row pattern having row lines and row spaces, the row lines masking off unexposed portions of the underlying column pattern and the row spaces leaving exposed portions of the underlying column pattern; removing at least some of the exposed portions of the column pattern to define a combined mask layer; and removing portions of the row lines to define a mask of isolated islands.

37. The method of claim 36, wherein the row pattern has been extended into an underlying layer before the row lines are removed.

38. A method of forming a feature array for an integrated circuit comprising: forming a first feature array in a first mask layer, a plurality of first features of the first feature array being elongate with a first axis of elongation, the first feature array having a first pattern; forming a second feature array in a second mask layer, a plurality of second features of the second feature array having elongate features with a second axis of elongation that is not parallel to the first axis, the second feature array having a second pattern; consolidating the first and second patterns into a combined third pattern, the third pattern corresponding to an arrangement of features in a single vertical level of the integrated circuit; and pitch multiplying the first features and the second features; wherein the first features and the second features of the first and second patterns are pitch multiplied before the first and second patterns are consolidated into the combined third pattern.

39. The method of claim 38, wherein the first features are pitch multiplied before the second features are formed.

40. The method of claim 38, wherein the first features and the second features are pitch multiplied in separate steps.

41. The method of claim 38, wherein the arrangement of features in a single vertical level of the integrated circuit comprises mask pillars.

42. The method of claim 38, wherein the arrangement of features in a single vertical level of the integrated circuit comprises holes in a mask grid.

REFERENCE TO RELATED APPLICATIONS

This application is related to the following: U.S. patent application Ser. No. 10/932,993 (MICRON.293A) filed Sep. 1, 2004; U.S. patent application Ser. No. 10/934,778 (MICRON.294A) filed Sep. 2, 2004; U.S. patent application Ser. No. 10/931,771 (MICRON.295A) filed Aug. 31, 2004; U.S. patent application Ser. No. 10/934,317 (MICRON.296A) filed Sep. 2, 2004. Each of the above-mentioned references is hereby incorporated by reference in its entirety and hereby made part of this specification.

BACKGROUND OF THE INVENTION

1. Field of the Invention

The disclosed invention relates generally to integrated circuit fabrication, techniques for fabrication of computer memory, and masking techniques.

2. Description of the Related Art

As a consequence of many factors, including demand for increased portability, computing power, memory capacity and energy efficiency in modern electronics, integrated circuits are continuously being reduced in size. To facilitate this size reduction, research continues into ways of reducing the sizes of integrated circuits' constituent features. Examples of those constituent features include capacitors, electrical contacts, interconnecting lines, and other electrical devices. The trend of decreasing feature size is evident, for example, in memory circuits or devices such as dynamic random access memories (DRAMs), static random access memories (SRAMs), ferroelectric (FE) memories, electronically-erasable programmable read-only memories (EEPROMs), flash memories, etc.

Computer memory typically comprises millions of identical circuit elements, known as memory cells, arranged in a plurality of arrays with associated logic circuitry. Each memory cell traditionally stores one bit of information, although multi-level cell devices can store more than one bit per cell. In its most general form, a memory cell typically consists of two electrical devices: a storage capacitor and an access field effect transistor. Each memory cell is an addressable location that can store one bit (binary digit) of data. A bit can be written to a cell through the transistor and read by sensing charge on the storage electrode from the reference electrode side. One common type of computer memory that can benefit from higher density components is DRAM. By decreasing the sizes of constituent electrical devices, the conducting lines that connect them, and the conductive contacts carrying charge between them, the sizes of the memory devices incorporating these features can be decreased. Storage capacities and circuit speed can be increased by fitting more memory cells into the memory devices.

The demand for continual reduction in feature sizes places ever greater demands on techniques used to form the features. For example, photolithography is commonly used to pattern features on a substrate. The concept of pitch can be used to describe the size of these features. Pitch is the distance between identical points in two neighboring features. These features are typically defined by spaces between adjacent features, which spaces may be filled by a material, such as an insulator. As a result, pitch can be viewed as the sum of the width of a feature and of the width of the space separating that feature from a neighboring feature.

Certain photoresist materials only respond to certain wavelengths of light. One common range of wavelengths that can be used lies in the ultraviolet (UV) range. Because many photoresist materials respond selectively to particular wavelengths, photolithography techniques each have a minimum pitch below which that particular photolithographic technique cannot reliably form features. This minimum pitch is often determined by the wavelength of light that can be used with that technique. Thus, the minimum pitch of a photolithographic technique can limit feature size reduction.

Pitch multiplication (or pitch doubling) can extend the capabilities of photolithographic techniques to allow creation of more densely arranged features. Such a method is illustrated in FIGS. 1A-1F and described in U.S. Pat. No. 5,328,810, issued to Lowrey et al., the entire disclosure of which is incorporated herein by reference and made part of this specification. For convenience, the method will also be briefly outlined here.

With reference to FIG. 1A, photolithography is first used to form a pattern of lines 10 in a photoresist layer overlying a layer 20 of an expendable material and a substrate 30 . The layers shown in FIG. 1 are all shown schematically in cross-section. As shown in FIG. 1B, the pattern is then transferred by an etch step (preferably anisotropic) to the layer 20 , forming placeholders, or mandrels, 40 . If the etch is anisotropic, the mandrels have approximately vertical sides, as shown. The photoresist lines 10 can be stripped and the mandrels 40 can be isotropically etched to increase the distance between neighboring mandrels 40 , as shown in FIG. 1C. This isotropic etch (or shrink step) can alternatively be performed on the resist prior to transfer. A layer 50 of spacer material is subsequently deposited over the mandrels 40 , as shown in FIG. 1D. Spacers 60 , i.e., material extending or originally formed extending from sidewalls of another material, are then formed on the sides of the mandrels 40 by preferentially etching the spacer material from the horizontal surfaces 70 and 80 in a directional (or anisotropic) spacer etch. Such spacers are shown in FIG. 1E. The remaining mandrels 40 are then removed, leaving behind only the spacers 60 above substrate 30 . The spacers 60 together act as a mask for patterning, as shown in FIG. 1F. Thus, where a given pitch formerly included a pattern defining one feature and one space, the same width now includes two features and two spaces defined by the spacers 60 . As a result, the smallest feature size possible with a photolithographic technique is effectively decreased by this “pitch-multiplication” technique.

While the pitch is actually halved in the example above, this reduction in pitch is conventionally referred to as pitch “doubling,” or, more generally, pitch “multiplication.” That is, conventionally “multiplication” of pitch by a certain factor actually involves reducing the pitch by that factor. In fact, “pitch multiplication” increases the density of features by reducing pitch. Pitch thus has at least two meanings: the linear spacing between identical features in a repeating pattern; and the density or number of features per linear distance. The conventional terminology is retained herein.

The critical dimension (CD) of a mask scheme or circuit design is the scheme's minimum feature dimension, or the measurement of the smallest width of the smallest feature that exists in that design or scheme. Due to factors such as geometric complexity and different requirements for critical dimensions in different parts of an integrated circuit, typically not all features of the integrated circuit will be pitch multiplied. Furthermore, pitch multiplication entails many additional steps relative to conventional lithography; the additional steps can involve considerable additional expense. Pitch multiplication often provides less control over the resulting features than that provided by direct patterning without pitch multiplication, because the spacer pattern merely follows the outlines of the directly patterned features. Thus, pitch multiplication is typically thought useful only for regularly spaced lines, such as conductive lines for a memory array. On the other hand, typical micromasking techniques, such as isotropic shrink steps, can result in a reduction in feature size but no corresponding increase in feature density. There have also been challenges in transferring very fine patterns to underlying layers because existing techniques do not adequately maintain resolution and fidelity through the transfer. There is a need for methods that can allow for smaller and more efficient operative units on an integrated circuit; such methods will advantageously increase feature density and decrease chip size.

Thus, there is a need for a reduction in the size of integrated circuits and an increased operable density of the arrays of electrical devices on computer chips. Accordingly, a need exists for improved methods of forming small features; improved methods for increasing feature density; methods that will produce more efficient arrays; and techniques that will provide more compact arrays without harming feature resolution.

SUMMARY OF THE INVENTION

In some embodiments, the invention comprises a method of forming isolated features in an integrated circuit. The method can comprise providing a substrate overlaid by multiple layers of masking material and creating a first series of selectively definable lines in a first layer of masking material. The method can further comprise reducing the pitch of the first series of selectively definable lines using a spacer material to create a first arrangement of masking features having a smaller pitch than the first series of selectively definable lines. The first arrangement of masking features can comprise pitch-reduced masking lines separated by pitch-reduced spaces and can correspond to a first pattern. The method can further comprise creating a second series of selectively definable lines in a second layer of masking material, where the second series of selectively definable lines is not parallel to the first series of selectively definable lines. The method can further comprise reducing the pitch of the second series of selectively definable lines using a spacer material to create a second arrangement of masking features having a smaller pitch than the second series of selectively definable lines. The second arrangement of masking features can comprise pitch-reduced masking lines separated by pitch-reduced spaces and can correspond to a second pattern. The method can further comprise etching the substrate in a third pattern derived by superimposing the first and second patterns to create isolated features.

In some embodiments, the invention comprises a method for forming features in an array. The method can comprise reducing the pitch of a column of first photodefinable lines to form a column pattern. The method can also comprise reducing the pitch of a row of second photodefinable lines to form a row pattern that crosses the column pattern. The row pattern can have row lines and row spaces. The row lines can mask off unexposed portions of the underlying column pattern, and the row spaces can leave exposed portions of the underlying column pattern. The method can further comprise removing at least some of the exposed portions of the column pattern to define a combined mask layer.

In some embodiments, the invention comprises a mask pattern for an integrated circuit. The mask pattern can comprise a first series of elongate masking lines and a second series of elongate masking lines that intersects the first series of elongate masking lines. In the mask pattern, each series of lines can have a pitch that is smaller than the pitch achievable through photolithography.

In some embodiments, the invention comprises an arrangement of isolated features formed as part of an integrated circuit manufacturing process. The arrangement can have a first row of elongate features formed from spacer material and a second row of elongate features formed from spacer material. The elongate features in the second row can cross the elongate features in the first row such that each elongate feature in one row crosses multiple elongate features in the other row.

In some embodiments, the invention comprises an arrangement of isolated features in an integrated circuit. The arrangement can have regularly-spaced features having a first width of less than 60 nanometers and a first length of no more than 10 times the first width. Furthermore, the spaces between features can have a second width of less than 60 nanometers.

In some embodiments, the invention comprises a method of forming a feature array for an integrated circuit. The method can include forming a first, pitch-multiplied feature array in a first mask layer, the features being elongate with an axis of elongation. The first feature array can have a first pattern. The method can further include forming a second, pitch-multiplied feature array in a second mask layer, the second pitch-multiplied feature array having elongate features with an axis of elongation that is not parallel to the axis of the elongate features of the first feature array. The second feature array can have a second pattern. The method can further include consolidating the first and second patterns into a combined third pattern, the third pattern corresponding to an arrangement of features in a single vertical level of the integrated circuit.

In some embodiments, the invention comprises a system for processing information in electrical format. The system can include at least one electrical circuit. The system can further include densely-spaced features in a repeating pattern, formed in a layer of material in the electrical circuit. Each feature can have a first width of less than 60 nanometers and a first length of less than 10 times the first width. Furthermore, each feature can be spaced apart from adjacent features by less than 120 nanometers.

BRIEF DESCRIPTION OF THE DRAWINGS

The invention will be better understood from the Detailed Description of the Preferred Embodiments and from the appended drawings, which are meant to illustrate and not to limit the invention, and wherein:

FIGS. 1A-1F are schematic, cross-sectional side views of mask lines, formed in accordance with a prior art pitch-multiplication method as described above.

FIG. 2 is a schematic, cross-sectional side view of masking and substrate layers used to form an integrated circuit.

FIG. 3 shows the structure of FIG. 2 after photolithographic patterning of a first resist layer.

FIG. 4 shows the structure of FIG. 3 after an etch has reduced the size of the features in the pattern of FIG. 3.

FIG. 5 shows a schematic, cross-sectional side view of masking and substrate layers used to form an integrated circuit after the pattern of FIG. 4 has been extended into underlying layers.

FIG. 6 shows the structure of FIG. 5 after overlying layers have been stripped.

FIG. 7 shows the structure of FIG. 6 after blanket deposition of a spacer material.

FIG. 8 shows the structure of FIG. 7 after a spacer etch and subsequent etch, leaving a pattern of free-standing spacers that has been extended into an underlying layer.

FIG. 9 shows the structure of FIG. 8 after blanket deposition of a filler material.

FIGS. 10A-10D show the structure of FIG. 9 after a CMP process or dry etch has removed the spacers and excess filler material. FIG. 10A shows a schematic plan view of the surface. FIG. 10B shows a schematic cross-sectional side view taken along lines 10 B- 10 B of FIG. 10A. FIG. 10C shows a schematic, cross-sectional side view taken along lines 10 C- 10 C of FIG. 10B. FIG. 10D shows a schematic, cross-sectional side view taken along lines 10 D- 10 D of FIG. 10B.

FIGS. 11A-11D show the structure of FIG. 10 after deposition of multiple new layers. FIG. 11A shows a schematic plan view of the surface. FIG. 11B shows a schematic cross-sectional side view taken along lines 11 B- 11 B of FIG. 11A. FIG. 11C shows a schematic, cross-sectional side view taken along lines 11 C- 11 C of FIG. 11B. FIG. 11D shows a schematic, cross-sectional side view taken along lines 11 D- 11 D of FIG. 11B.

FIGS. 12A-12D show the structure of FIG. 11 after photolithographic patterning of a second resist layer. FIG. 12A shows a schematic plan view of the surface. FIG. 12B shows a schematic cross-sectional side view taken along lines 12 B- 12 B of FIG. 12A. FIG. 12C shows a schematic, cross-sectional side view taken along lines 12 C- 12 C of FIG. 12B. FIG. 12D shows a schematic, cross-sectional side view taken along lines 12 D- 12 D of FIG. 12B.

FIGS. 13A-13D show the structure of FIG. 12 after an etch has reduced the size of the features in the pattern of FIG. 12. FIG. 13A shows a schematic plan view of the surface. FIG. 13B shows a schematic cross-sectional side view taken along lines 13 B- 13 B of FIG. 13A. FIG. 13C shows a schematic, cross-sectional side view taken along lines 13 C- 13 C of FIG. 13B. FIG. 13D shows a schematic, cross-sectional side view taken along lines 13 D- 13 D of FIG. 13B.

FIGS. 14A-14D show the structure of FIG. 13 after the pattern of the features of FIGS. 13A-13D has been extended into underlying layers to partially expose the crossing underlying pattern. FIG. 14A shows a schematic plan view of the surface. FIG. 14B shows a schematic cross-sectional side view taken along lines 14 B- 14 B of FIG. 14A. FIG. 14C shows a schematic, cross-sectional side view taken along lines 14 C- 14 C of FIG. 14B. FIG. 14D shows a schematic, cross-sectional side view taken along lines 14 D- 14 D of FIG. 14B.

FIGS. 15A-15D show the structure of FIG. 14 after overlying layers have been stripped. FIG. 15A shows a schematic plan view of the surface. FIG. 15B shows a schematic cross-sectional side view taken along lines 15 B- 15 B of FIG. 15A. FIG. 15C shows a schematic, cross-sectional side view taken along lines 15 C- 15 C of FIG. 15B. FIG. 15D shows a schematic, cross-sectional side view taken along lines 15 D- 15 D of FIG. 15B.

FIGS. 16A-16D show the structure of FIG. 15 after blanket deposition of a spacer material. FIG. 16A shows a schematic plan view of the surface. FIG. 16B shows a schematic cross-sectional side view taken along lines 16 B- 16 B of FIG. 16A. FIG. 16C shows a schematic, cross-sectional side view taken along lines 16 C- 16 C of FIG. 16B. FIG. 16D shows a schematic, cross-sectional side view taken along lines 16 D- 16 D of FIG. 16B.

FIGS. 17A-17D show the structure of FIG. 16 after a spacer etch and subsequent etch (that has removed the mandrels), leaving a pattern of free-standing spacers that are orthogonal to the underlying pattern. FIG. 17A shows a schematic plan view of the surface. FIG. 17B shows a schematic cross-sectional side view taken along lines 17 B- 17 B of FIG. 17A. FIG. 17C shows a schematic, cross-sectional side view taken along lines 17 C- 17 C of FIG. 17B. FIG. 17D shows a schematic, cross-sectional side view taken along lines 17 D- 17 D of FIG. 17B.

FIGS. 18-20 illustrate a process flow that can be used in conjunction with the structure of FIG. 17 to create a mask grid with small holes that are densely spaced in an advantageous manner.

FIGS. 18A-18E show the structure of FIG. 17 after an etch (e.g., a silicon dioxide etch) has removed portions of several exposed layers, while leaving intact one of the stripe materials of exposed portions of the underlying pattern. FIG. 18A shows a schematic plan view of the surface. FIG. 18B shows a schematic cross-sectional side view taken along lines 18 B- 18 B of FIG. 18A. FIG. 18C shows a schematic, cross-sectional side view taken along lines 18 C- 18 C of FIGS. 18A and 18B. FIG. 18D shows a schematic, cross-sectional side view taken along lines 18 D- 18 D of FIGS. 18A and 18B. FIG. 18E shows a schematic, cross-sectional side view taken along line 18 E- 18 E of FIG. 18A.

FIGS. 19A-19D show the structure of FIG. 18 after extending the pattern of two overlying layers into an underlying mask or temporary layer, forming holes in the underlying layer. In the illustrated embodiment, the underlying temporary layer is amorphous carbon. FIG. 19A shows a schematic plan view of the surface. FIG. 19B shows a schematic cross-sectional side view taken along lines 19 B- 19 B of FIG. 19A. FIG. 20C shows a schematic, cross-sectional side view taken along lines 19 C- 19 C of FIG. 19B. FIG. 19D shows a schematic, cross-sectional side view taken along lines 19 D- 19 D of FIG. 19B.

FIGS. 20A-20D show the structure of FIG. 19 after overlying layers have been stripped to leave a pattern of holes in the lower temporary or mask (e.g., amorphous carbon) layer. FIG. 20A shows a schematic plan view of the surface. FIG. 20B shows a schematic cross-sectional side view taken along lines 20 B- 20 B of FIG. 20A. FIG. 20C shows a schematic, cross-sectional side view taken along lines 20 C- 20 C of FIG. 20A. FIG. 20D shows a schematic, cross-sectional side view taken along lines 20 D- 20 D of FIG. 20A.

FIG. 21A shows the structure of FIG. 20C after the pattern of holes in the third temporary layer has been extended into the substrate, the third temporary layer has been removed, and the holes have been filled with conductive material.

FIG. 21B shows the structure of FIG. 21A after the overflow conductive material has been etched away.

FIGS. 22-25 illustrate a process flow that can be used in conjunction with the structure of FIG. 17 to create small mask pillars that are densely packed in an advantageous manner.

FIGS. 22A-22E show the structure of FIG. 17 after an etch (e.g., an amorphous silicon etch) to remove one of the stripe materials of exposed portions of the underlying pattern. FIG. 22A shows a schematic plan view of the surface. FIG. 22B shows a schematic cross-sectional side view taken along lines 22 B- 22 B of FIG. 22A. FIG. 22C shows a schematic, cross-sectional side view taken along lines 22 C- 22 C of FIGS. 22A and 22B. FIG. 22D shows a schematic, cross-sectional side view taken along lines 22 D- 22 D of FIGS. 22A and 22B. FIG. 22E shows a schematic, cross-sectional side view taken along line 22 E- 22 E of FIG. 22A.

FIGS. 23A-23D show the structure of FIG. 22 after a selective etch, (e.g., a silicon dioxide etch) has etched down portions of exposed materials in FIG. 22 to expose portions of an underlying mask or temporary layer. In the illustrated embodiment, the underlying temporary layer is amorphous carbon. The selective etch has not removed islands of one of the stripe materials (e.g., silicon) that remain in place over the temporary layer. FIG. 23A shows a schematic plan view of the surface. FIG. 23B shows a schematic cross-sectional side view taken along lines 23 B- 23 B of FIG. 23A.

FIGS. 24A-24B show the structure of FIG. 23 after etching the exposed portions of the underlying temporary layer. The island pattern has thus been extended into the underlying material, leaving standing pillars or posts protected by silicon caps.

FIGS. 25A-25B show the structure of FIG. 24 after a silicon etch has removed the silicon caps from the pillars or posts. The pillars can be used as a mask for an underlying material.

FIGS. 26-27 illustrate an alternative process flow that can be used in conjunction with the structure of FIG. 17 to create small mask pillars, posts or islands that are densely and/or evenly spaced in an advantageous manner.

FIGS. 26A-26D show the structure of FIG. 17 after a nonselective etch (for example a sputter etch or reactive ion etch) that etches exposed portions of both striped materials, exposing crossing lines of an underlying mask or temporary layer. In the illustrated embodiment, the underlying temporary layer is amorphous carbon. FIG. 26A shows a schematic plan view of the surface. FIG. 26B shows a schematic cross-sectional side view taken along lines 26 B- 26 B of FIG. 26A. FIG. 26C shows a schematic, cross-sectional side view taken along lines 26 C- 26 C of FIG. 26B. FIG. 26D shows a schematic, cross-sectional side view taken along lines 26 D- 26 D of FIG. 26B.

FIGS. 27A-27D show the structure of FIG. 26 after the spacer pattern has been extended into an underlying layer (i.e., an amorphous carbon layer). FIG. 27A shows a schematic plan view of the surface. FIG. 27B shows a schematic cross-sectional side view taken along lines 27 B- 27 B of FIG. 27A. FIG. 27C shows a schematic, cross-sectional side view taken along lines 27 C- 27 C of FIG. 27B. FIG. 27D shows a schematic, cross-sectional side view taken along lines 27 D- 27 D of FIG. 27B.

FIGS. 28A-28B show the structure of FIG. 27 after removal of the spacers, one of the stripe materials, and extension of the island pattern into the remaining portions of an underlying layer to leave standing pillars or posts, protected by amorphous silicon caps.

FIGS. 29A-29B are scanning electron micrographs (SEMs) illustrating a cross-sectional view of a dense array of small holes formed according to the described embodiments.

FIGS. 30A-30B are scanning electron micrographs (SEMs) illustrating a perspective views of a dense array of small holes formed according to the described embodiments.

FIGS. 31A-31C are SEMs illustrating a dense array of small holes formed according to the described embodiments. FIG. 30 b illustrates a cross section of FIG. 30 a in one dimension, and FIG. 30 c illustrates a cross section of FIG. 30 a in an approximately perpendicular dimension.

FIG. 32 is an SEM illustrating a dense array of small holes formed according to the described embodiments.

FIGS. 32A-33B are SEMs of an array of small, dense pillars or posts in accordance with the disclosed embodiments.

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENT

With reference to FIG. 2, a partially formed integrated circuit 100 is provided. A substrate 110 is provided below various masking layers 120 - 170 . The layers 120 - 170 can be etched to form masks for patterning underlying layers or substrate 110 . These masks can be used to form various features, as discussed below. The features can comprise portions of any of the following: one or multiple transistors, diodes, capacitors, conductive lines, gates, sources, drains, or contacts to any of the above. These components can comprise portions of DRAM or flash memory arrays, NOR logic arrays, NAND logic arrays, etc. In some embodiments, the features are formed from a substrate material that comprises a semi-conducting material. For example, the semi-conducting material can be silicon, silicon-germanium compounds, or III-V materials.

As used in this specification, the term “substrate” can refer not only to the substrate layer 110 , but also to any layer that underlies another layer. The term “substrate” can also describe a layer or layers that have features or structures formed within them as a result of a semiconductor process (e.g., etching, doping, depositing, etc.) controlled by overlying masking layers.

As used in this specification, the term “pattern” can refer to an array or series of shapes that would be visible on a surface if viewed from above. A pattern can refer to the ensemble of shapes that correspond to a cross-section or shadow of features formed in one or multiple layers. The pattern is generally not the features themselves, but rather the design corresponding to the sizes and arrangement of the features. A pattern can be defined by a combination of patterns derived from multiple overlying or side by side layers. A pattern can originate in one layer, such as a photodefinable layer, and then be transferred to another layer, such as a temporary layer or a hard mask layer. The pattern is said to be transferred to lower layers even if feature sizes and spacings are altered (e.g., by the feature shrink step noted above). In contrast, a new pattern can be defined by pitch multiplication, whereby two or more features in the second pattern replace one feature of the first pattern.

A pattern in one layer can be derived from one or more patterns in another previous or overlying layer. A pattern can be said to be derived from another pattern even if the features in the resulting layer do not exactly resemble those features which gave rise to the original pattern, but rather the underlying pattern generally follows the outline of the overlying pattern with minor deviations in dimensions. The term “to pattern” can also be used as a verb and means to create or form a pattern.

An arrangement of features formed in a particular layer can give rise to a pattern. An array can also give rise to a pattern. An array is a collection of electrical components or features, formed in a repeating configuration, that can span multiple layers of an integrated circuit. As described above, multiple cells can form a memory array for a DRAM or NAND flash memory circuit, for example, or a logic array.

The materials for the layers 120 - 170 overlying the substrate 110 are preferably chosen based upon consideration of the chemistry and process conditions for the various pattern forming and pattern transferring steps discussed herein. Because the layers between a topmost selectively definable layer 120 —which preferably is definable by a lithographic process—and the substrate 110 will preferably function to transfer a pattern derived from the selectively definable layer 120 to the substrate 110 , the layers between the selectively definable layer 120 and the substrate 110 are preferably chosen so that they can be selectively etched relative to other exposed materials. A material is considered selectively, or preferentially, etched when the etch rate for that material is at least about two times greater, preferably about ten times greater and, most preferably, at least about forty times greater than that for surrounding materials.

In the illustrated embodiment of FIG. 2, the selectively definable layer 120 overlies a first hard mask, or etch stop, layer 130 , which overlies a first temporary layer 140 , which overlies a second temporary layer 150 , which overlies a second hard mask, or etch stop, layer 160 , which overlies a third temporary layer 170 to be processed (e.g., etched) through a mask, which overlies the substrate layer 110 . In the illustrated embodiments, the third temporary layer 170 will serve as the ultimate mask through which etching (or other processing) will be performed. In some embodiments, amorphous carbon is a preferred material for the third temporary layer because so many other materials-silicon, silicon oxide, silicon nitride, etc.—can be selectively etched without significantly harming the carbon layer. For the illustrated embodiments, the substrate 110 may comprise an interlevel dielectric (ILD) layer through which contacts are to be formed.

In common methods of transferring patterns, both the mask and the underlying substrate are exposed to an etchant, which preferentially etches away the substrate material. The etchants, however, can also wear away the mask materials, albeit at a slower rate. Thus, over the course of transferring a pattern, the mask can be worn away by the etchant before the pattern transfer is complete. These difficulties are exacerbated where the substrate 110 comprises multiple different materials to be etched. In such cases, additional mask layers (not shown) may be used to prevent the mask pattern from being worn away before the pattern transfer is complete.

Because the various layers are chosen based upon the requirements of chemistry and process conditions, one or more of the layers can be omitted in some embodiments. In the illustrated embodiments, hard mask layers 130 and 160 advantageously play a protective role, protecting underlying layers from unwanted degradation during etching of overlying layers. Similarly, for a particularly simple substrate 110 , various other layers, such as the second hard mask layer 160 itself, may be omitted and overlying mask layers may be sufficient for the desired pattern transfer. Higher numbers of mask layers are advantageous for transferring patterns to difficult to etch substrates, such as a substrate comprising multiple materials or multiple layers of materials, or for forming small and high aspect ratio features.

With reference to FIG. 2, the selectively definable layer 120 is preferably formed of a photoresist, including any photoresist known in the art. For example, the photoresist can be any photoresist compatible with 13.7 nanometer (nm), 157 nm, 193 nm, 248 nm or 365 nm wavelength systems, 193 nm wavelength immersion systems or electron beam lithographic systems. Examples of preferred photoresist materials include argon fluoride (ArF) sensitive photoresist, i.e., photoresist suitable for use with an ArF light source, and krypton fluoride (KrF) sensitive photoresist, i.e., photoresist suitable for use with a KrF light source. ArF photoresists are preferably used with photolithography systems utilizing relatively short wavelength light, e.g., 193 nm. KrF photoresists are preferably used with longer wavelength photolithography systems, such as 248 nm systems. In other embodiments, the layer 120 and any subsequent resist layers can be formed of a resist that can be patterned by nano-imprint lithography, e.g., by using a mold or mechanical force to pattern the resist.

Photoresist is typically patterned by being exposed to radiation through a reticle and then developed. In the case of negative photoresist, radiation, e.g., light, is focused on parts of the photoresist that are to be retained, e.g., on the areas where the lines—such as lines 124 (see FIG. 3 )—are to be formed. Typically, the radiation activates a photosensitive compound, e.g., a photo-induced acid generator (PAG), which decreases the solubility of the photoresist, e.g., by causing it to polymerize. Preferred embodiments may be applied using any definable material, including positive or negative photoresist. A preferred reticle used in testing of some embodiments is T37Z 46/47reticle.

The material for the first hard mask layer 130 preferably comprises an inorganic material, and exemplary materials include silicon dioxide (SiO ₂ ), silicon, or a dielectric anti-reflective coating (DARC), such as a silicon-rich silicon oxynitride. In the illustrated embodiment, the first hard mask layer 130 is a dielectric anti-reflective coating (DARC). Thus, hard mask layer 130 can serve both as an intermediate hard mask and to reduce reflections during lithography. Using DARC material for the first hard mask layer 130 can be particularly advantageous for forming patterns having pitches near the resolution limits of a photolithographic technique. The DARC can enhance resolution by minimizing light reflections, thus increasing the precision with which photolithography can define the edges of a pattern. Optionally, an organic bottom anti-reflective coating (BARC) (not shown) can similarly be used in addition to or in place of the first hard mask layer 130 to control light reflections.

The first temporary layer 140 is preferably formed of amorphous carbon, which offers very high etch selectivity relative to the preferred hard mask materials. More preferably, the amorphous carbon is a form of transparent carbon that is highly transparent to light and which offers further improvements for photo alignment by being transparent to wavelengths of light used for such alignment. Deposition techniques for forming a highly transparent carbon can be found in A. Helmbold, D. Meissner, Thin Solid Films, 283 (1996) 196-203, the entire disclosure of which is incorporated herein by reference and made part of this specification.

The second temporary layer 150 is preferably formed of amorphous silicon. The benefits of using amorphous silicon will become apparent in the context of the various etching and pattern transfer steps described below. Amorphous silicon can be selectively etched while other adjacent materials (such as oxide layers) remain intact.

The second hard mask, or etch stop layer 160 preferably comprises silicon dioxide (SiO ₂ ), silicon, or a dielectric anti-reflective coating (DARC), such as a silicon-rich silicon oxynitride, or aluminum oxide (Al ₂ O ₃ ). In the illustrated embodiment, the first hard mask layer 160 is a DARC.

The third temporary layer 170 is preferably formed of amorphous carbon, which has excellent etch selectivity relative to many materials. Benefits of amorphous carbon are further discussed above with respect to the first temporary layer 140 .

The substrate can be a silicon wafer used for formation of integrated circuits. Various substrate materials can be used.

In addition to selecting appropriate materials for the various layers, the thicknesses of the layers 120 - 170 are preferably chosen depending upon compatibility with the etch chemistries and process conditions described herein. For example, when transferring a pattern from an overlying layer to an underlying layer by selectively etching the underlying layer, materials from both layers are removed to some degree. Thus, the upper layer is preferably thick enough so that it is not worn away over the course of the pattern transfer. The hard mask layers are advantageously thin so that their transfer or removal can occur quickly, exposing surrounding materials to less wear.

In the illustrated embodiment, the selectively definable layer 120 (e.g., photoresist) is a photodefinable layer preferably between about 100-250 nm thick and, more preferably, between about 130-200 nm thick. The first hard mask layer 130 (e.g., SiO ₂ or DARC) is preferably between about 10-30 nm thick and, more preferably, between about 15-25 nm thick. The first temporary layer 140 (e.g., amorphous carbon) is preferably between about 100-200 nm thick and, more preferably, between about 120-150 nm thick. The second temporary layer 150 (e.g., amorphous silicon) is preferably between about 30-50 nm thick and, more preferably, between about 35-45 nm thick. The second hard mask layer 160 (e.g., SiO ₂ or DARC) is preferably between about 10-30 nm thick and, more preferably, about 15 nm thick. The third temporary layer 170 (e.g., amorphous carbon) is preferably between about 100-300 nm thick and, more preferably, between about 150-250 nm thick.

The various layers discussed herein can be formed by various methods known to those of skill in the art. For example, various vapor deposition processes, such as chemical vapor deposition, can be used to form the various mask layers under the resist. Preferably, a low temperature chemical vapor deposition process is used to deposit the hard mask layers or any other materials, e.g., spacer material, over carbon. Such low temperature deposition processes advantageously prevent chemical or physical disruption of the underlying amorphous carbon layer. Spin-on-coating processes can be used to form photodefinable layers. In addition, amorphous carbon layers can be formed by chemical vapor deposition using a hydrocarbon compound, or mixtures of such compounds, as carbon precursors. Exemplary precursors include propylene, propyne, propane, butane, butylene, butadiene and acetylene. A suitable method for forming amorphous carbon layers is described in U.S. Pat. No. 6,573,030 B1, issued to Fairbairn et al. on Jun. 3, 2003, the entire disclosure of which is incorporated herein by reference and made part of this specification. In addition, the amorphous carbon may be doped. A suitable method for forming doped amorphous carbon is described in U.S. patent application Ser. No. 10/652,174 to Yin et al., the entire disclosure of which is incorporated herein by reference and made part of this specification.

First Phase

In a first phase of methods in accordance with the preferred embodiments and with reference to FIGS. 2-10, a pattern of spacers is formed by pitch multiplication and used to create an underlying striped structure (see FIG. 10) for subsequent method steps. One example of an etch sequence for this phase is the following: 1) deposition of multiple layers; 2) photolithographic patterning of a first layer; 3) shrinking of features; 4) extension of pattern into underlying layers; 5) removal of remaining portions of overlying layers; 6) blanket deposition of spacer material; 7) spacer etch; 8) removal of spacer mandrels; 9) extension of spacer pattern into underlying material; 10) blanket deposition of a filler material; 11) removal of spacers; and 12) planarization.

With reference to FIG. 3, a pattern comprising gaps or spaces 122 delimited by definable material features 124 is formed in the definable layer 120 . The spaces 122 can be formed by, e.g., photolithography, in which the selectively definable layer 120 is exposed to radiation through a reticle and then developed. After being developed, the remaining definable material, photoresist in the illustrated embodiment, forms mask features such as the illustrated lines 124 (shown in cross-section).

The pitch of the lines 124 is equal to the sum of the width of a line 124 and the width of a neighboring space 122 . To minimize the critical dimensions of features formed using this pattern of lines 124 and spaces 122 , the pitch is preferably at or near the limits of the photolithographic technique used to pattern the definable layer 120 . For example, for photolithography utilizing 248 nm light, the pitch of the lines 124 can be about 200 nm. Thus, the pitch may be at the minimum pitch of the photolithographic technique and the spacer pattern discussed below can advantageously have a pitch below the minimum pitch of the photolithographic technique.

As illustrated by FIG. 3, a preliminary step can comprise creating a series of photoresist lines 124 . Thus, photolithography can be used to form a plurality of lines in a mask material. Conventional photolithography can form lines having a pitch no smaller than that definable by photons. However, subsequent pitch multiplication can form lines having a pitch that is smaller than that definable by conventional photolithography.

FIG. 4 shows the structure of FIG. 3 after the lines 124 have been shrunk by an isotropic etch to create modified lines 124 a. The spaces 122 can optionally be widened or narrowed to a desired dimension. For example, as illustrated in FIG. 6, the spaces 122 have been widened by etching the photoresist lines 124 , to form modified spaces 122 a and modified lines 124 a. The photoresist lines 124 are preferably reduced in size using an isotropic etch, such as a sulfur oxide plasma, e.g., a plasma comprising SO ₂ , O ₂ , N ₂ and Ar, or any other suitable plasma. Two other plasmas that can be used, for example, are an HBr/O ₂ plasma or a Cl ₂ /O ₂ plasma. The isotropic etch degrades the exposed surfaces from all directions. Thus, the corners of lines 124 a have been depicted as slightly rounded in FIG. 4. The extent of the etch is preferably selected so that the widths of the lines 124 a are substantially equal to the desired spacing between the later-formed spacers 182 , as will be appreciated from the discussion of FIGS. 7-8. Advantageously, this etch allows the lines 124 a to be narrower than would otherwise be possible using the photolithographic technique used to pattern the photodefinable layer 120 . That is, if the lines 124 are at or near the resolution limit of the photolithographic technique, this etch can reduce their size even further, taking them below that resolution limit. In addition, the etch can smooth the edges of the lines 124 a, thus improving the uniformity of those lines.

In some embodiments, the spaces 122 a between the lines 124 a can be narrowed by expanding the lines 124 to a desired size. For example, additional material (not shown) can be deposited over the lines 124 , or the lines 124 can be chemically reacted to form a material (not shown) having a larger volume to increase their size.

In the illustrated embodiment, the modified lines 124 a define the dimensions of placeholders or mandrels along which a pattern of spacers 182 (FIG. 8) will be formed after transfer of the pattern to an underlying layer (FIGS. 5 and 6) and blanket deposition of a spacer material 180 (FIG. 7). In alternative embodiments, if the deposition and etch of spacer material is compatible with the definable layer 120 , the temporary layer 140 can be omitted and the spacer material can be deposited directly on the photo-defined lines 124 or the thinner lines 124 a.

In other alternative embodiments, the pattern of the lines 124 can be transferred to underlying layers without first being trimmed or having their width's reduced as described above. In such embodiments, a pattern corresponding to that of lines 124 can be formed in the temporary layer 140 and the features of that pattern can be reduced in width with a shrink step.

As shown in FIG. 5, after modification of line width (FIG. 4), the pattern in the photodefinable layer 120 is preferably transferred to the first temporary layer 140 to allow for later deposition of a layer 180 of spacer material (FIG. 7). The temporary layer 140 is preferably formed of a material that can withstand the process conditions for spacer material deposition and etch, discussed below. In particular, the material forming the temporary layer 140 preferably has a higher heat resistance than photoresist and is preferably selected such that it can be selectively removed relative to the material for the spacers 182 (FIG. 8) and the underlying layer 150 . As noted above, the layer 140 is preferably formed of amorphous carbon.

As shown in FIG. 5, the pattern of lines 124 a and spaces 122 a in FIG. 4 can be extended into, or transferred to underlying layers. This pattern extension can be accomplished by selectively etching the materials that form layers 130 and 140 , while lines 124 a form a protective mask that prevents the etchant from removing the material located underneath lines 124 a.

To transfer the pattern into the hard mask layer 130 , an anisotropic etch can be used, such as an etch using a fluorocarbon plasma. A wet (isotropic) etch may also be suitable if the hard mask layer 130 is thin. Preferred fluorocarbon plasma etch chemistries include CF ₄ , CFH ₃ , CF ₂ H ₂ and CF ₃ H for etching the preferred DARC material.

To transfer the pattern into the first temporary layer 140 , an SO ₂ -containing plasma, e.g., a plasma containing SO ₂ , O ₂ and Ar, is preferably used. Advantageously, the SO ₂ -containing plasma can etch carbon of the preferred temporary layer 140 at a rate greater than 20 times and, more preferably, greater than 40 times the rate that the hard mask layer 130 is etched. A suitable SO ₂ -containing plasma is described in U.S. patent application Ser. No. 10/931,772 to Abatchev et al., filed Aug. 31, 2004, entitled Critical Dimension Control, (Atty. docket No. MICRON.286A; Micron Ref. No. 2003-1348), the entire disclosure of which is incorporated herein by reference and made part of this specification. Although FIG. 5 shows lines 124 a intact after the pattern has been extended into the first temporary layer 140 , the SO ₂ -containing plasma can simultaneously etch the temporary layer 140 and also remove the remaining portion of definable layer 120 .

As shown in FIG. 6, once the line pattern originally formed in the layer 120 has been extended down into the layer 140 , the remaining portions of the layer 120 can be stripped away using a selective etch. Alternatively, as noted above, the remaining portions of 120 can be etched away during an amorphous carbon etch step such as the step that extends the pattern down into the layer 140 . Thus, the line pattern originally formed in the definable layer 120 has been transferred to the hard mask and temporary layers 130 and 140 . The transferred pattern is approximately the same as the line pattern originally formed in layer 120 ; the transferred pattern has lines 144 a and spaces 142 a that generally correspond to lines 124 a and spaces 122 a, respectively. In the illustrated embodiment, portions of the hard mask layer 130 remain in place as protective caps on the lines 144 a. These portions of the layer 130 can act as etch stops in subsequent steps.

In the illustrated embodiment, a pattern is formed in an overlying layer and later transferred to an underlying layer. In FIG. 5, the illustrated walls of the features formed in layers 130 and 140 are vertical, where these layers have been etched. In order to achieve vertical sidewalls in this step and in other steps described herein, directional or anisotropic etches can be used.

Variations in etching processes can alter the precision with which a pattern in an overlying layer corresponds to a pattern created in an underlying layer. Although pattern transfer from layer to layer is generally illustrated schematically to be a precise process, with vertical walls, such precision may be difficult to achieve in practice. Thus, pattern transfer is intended to encompass general correspondence between underlying and overlying patterns. Similarly, pattern transfer is meant to encompass modification of the features originally defining the pattern—for example by enlarging or shrinking those features—where such modification does not change the pitch.

As shown in FIG. 7, a layer 180 of spacer material is preferably blanket deposited so that it conforms to the exposed surfaces, including the second temporary layer 150 and the lines 144 a. As shown, portions of the hard mask layer 130 can be left in place—to subsequently act as CMP etch stops—on top of lines 144 a when the layer 180 of spacer material is deposited. Alternatively, the hard mask portions can be removed with a selective etch before spacer deposition. The spacer material can be any material that can act as a mask for transferring a pattern to underlying layers, or that otherwise can allow processing of underlying structures through the mask being formed. The spacer material preferably: 1) can be deposited with good step coverage; 2) can be deposited at a temperature compatible with the temporary layer 140 and underlying layers; and 3) can be selectively etched relative to the temporary layer 140 and any layer directly underlying the temporary layer 140 . Preferred materials include silicon oxides and nitrides. The spacer material is preferably deposited by chemical vapor deposition or atomic layer deposition. The layer 180 is preferably deposited to a thickness of between about 20-60 nm and, more preferably, about 20-50 nm. Preferably, the step coverage is about 80% or greater and, more preferably, about 90% or greater.

FIG. 8 shows the structure of FIG. 7 after a spacer etch and subsequent etch, leaving a pattern of free-standing spacers that has been extended into an underlying layer. The spacer etch can comprise an anisotropic etch to remove spacer material from horizontal surfaces. The spacer etch can be performed using a fluorocarbon plasma. The spacer etch can also be performed using HBr/Cl plasma for a silicon spacer material. (Note that preferred embodiments use silicon oxide spacers, however). After a spacer etch is performed, it can leave behind a pattern of elongate spacers having effectively reduced pitch relative to the lines.

After the spacer etch, the remaining portions of hard mask layer 130 (if still present) and the temporary layer 140 are next removed to leave freestanding spacers 182 . The remaining portions (in the form of lines 144 a ) of the first temporary layer 140 are selectively removed, preferably using a sulfur-containing plasma etch such as an etch using SO ₂ . In this way, features of one pattern are removed to leave behind another pattern formed by the spacers.

Thus, in some embodiments, pitch-reduction has been performed using a spacer material to create masking features. The masking features formed in this way can have a smaller pitch than the photoresist lines and can comprise pitch-reduced masking lines separated by pitch-reduced spaces; pitch multiplication has been accomplished. In the illustrated embodiment, the pitch of the pattern formed by spacers 182 is roughly half that of the pattern formed by photoresist lines 124 a and spaces 122 a (FIGS. 3-5), where the pitch was originally determined by photolithography. Preferably, a spacer pattern having a pitch of about 100 nm can be formed.

With further reference to FIG. 8, the pattern formed by the spacers 182 can be extended into the underlying second temporary layer 150 . The extension can be accomplished with a selective etch chemistry. For example, if the spacers 182 are formed from silicon dioxide and the underlying layer 150 is formed from amorphous silicon, an etch can remove the latter while leaving the former largely intact. A preferred etch includes a physical component and preferably can also include a chemical component and can be, e.g., a reactive ion etch (RIE), such as an HBr/Cl ₂ etch. Such an etch can be performed, for example, using a LAM TCP9400 (available commercially from LAM Research Corporation of Fremont, Calif.) flowing about 0-50 sccm Cl ₂ and about 0-200 sccm HBr at about 7-60 mTorr pressure with about 300-1000 W top power and about 50-250 W bottom power.

FIG. 9 shows the structure of FIG. 8 after blanket deposition of a filler material 190 . The filler material 190 is advantageously formed from silicon dioxide (SiO ₂ ). In some preferred embodiments, the spacers 182 and the filler material 190 are formed from the same or similar materials, as will be better understood from the discussion of FIGS. 17-20, 22 - 23 , and 26 - 27 below. Thus, the spacers 182 and the filler material 190 can both be formed from silicon dioxide. One preferred process for depositing the filler material 190 (i.e., silicon dioxide) is Applied Materials' Producer® HARP™ system. (HARP stands for “High Aspect Ratio Process.”)

In an alternative embodiment, the spacers 182 can be removed before the filler material 190 is deposited. A wet etch can be used to remove the spacers if the hard mask layer 160 is formed from a DARC material. Removal of the spacers 182 can allow good coverage by the filler material 190 .

FIGS. 10-20, 22 - 23 , and 26 - 27 each illustrate at least four corresponding views, lettered A-D as follows: 10 A- 10 D, 11 A- 11 D, etc. The views designated with an “A” consistently show a top or plan view, where hatching has been included for convenience. The views B-C consistently show cross sections of the same structure depicted in the corresponding figure A. Furthermore, those views designated with a “B” consistently show the structure in the same orientation as other views designated with a “B.” The orientations are also similar for “C” designations, and likewise for “D” designations.

FIGS. 10A-10D show the structure of FIG. 9 after removal of the spacers 182 and a portion of the filler material 190 , through, for example, a chemical mechanical polishing (CMP) process. A dry etch or a plasma etch can also be used for planarization. If a CMP process is used, a thin etch stop layer is preferably added between the hard mask layer 160 and the temporary layer 150 . The etch stop layer can be formed from Si ₃ N ₄ , for example.

FIG. 10A shows a schematic plan view of the surface after the planarization. The surface exhibits a striped pattern with alternating stripes of the filler material 212 , which is amorphous silicon, for example, and the stripes 214 , which can be silicon dioxide, for example. The stripes 212 of amorphous silicon have been formed in the second temporary layer 150 and the stripes 214 of silicon dioxide are the remaining portions of the filler material 190 that fill the spaces between the stripes 212 . For convenience, the surface in FIG. 10A is depicted with cross-hatching to show the material that comprises the striped structures. The stripes 212 preferably have widths 213 in a range of approximately 30-70 nm. The stripes 214 preferably have widths 215 in a range of approximately 30-70 nm. More preferably, the stripes 212 and 214 each have widths 213 and 215 , respectively, of approximately 50 nm. In the latter case, the pattern formed by the stripes has a pitch of approximately 100 nm.

FIG. 10B shows a schematic cross-sectional side view taken along lines 10 B- 10 B of FIG. 10A. This view reveals that the two sets of stripes are formed on the same “level.” For convenience in this application, the term “level” is used to designate a portion of the integrated circuit that is generally located in a thick plane that is parallel to and equidistant from the plane of the surface of the substrate 110 . Thus, the layer 160 is located at a different level from that of layer 170 , but the stripes 212 and the stripes 214 are located at the same level. In contrast, the term “layer” is generally used to refer to a portion of the integrated circuit formed from the same material and deposited together.

FIG. 10C shows a schematic, cross-sectional side view taken along lines 10 C- 10 C of FIG. 10B. FIG. 10D shows a schematic, cross-sectional side view taken along lines 10 D- 10 D of FIG. 10B.

In a first phase of methods described and illustrated above with reference to FIGS. 2-10, a pattern of spacers has been formed by pitch multiplication and used to create an underlying striped structure or “first pattern” derived from and pitch multiplied relative to the pattern of the first resist mask.

Second Phase

In a second phase of methods in accordance with preferred embodiments and with reference to FIGS. 11-17, a second pattern of spacers is formed by pitch multiplication and used to create an overlying striped structure (see FIG. 17) that crosses the underlying striped structure of FIG. 10. One example of an etch sequence for this phase is the following: 1) deposition of multiple layers; 2) photolithographic patterning of an overlying layer; 3) shrinking of features; 4) extension of pattern into underlying layers; 5) removal of remaining portions of overlying layers; 6) blanket deposition of spacer material; 7) spacer etch; 8) removal of spacer mandrels.

FIGS. 11A-11D show the structure of FIG. 10 after deposition of multiple new masking layers, 320 - 340 . The pattern having the stripes 212 and the stripes 214 now underlies multiple new layers of material. As with the layers 120 - 170 , layers 320 - 340 can also be etched to form masks for patterning underlying layer(s) of substrate 110 . These masks can be used to form various features, as discussed below. The features can comprise portions of one or multiple integrated circuit components.

FIG. 11A shows a schematic plan view of the surface. FIG. 11B shows a schematic cross-sectional side view taken along lines 11 B- 11 B of FIG. 11A. FIG. 11C shows a schematic, cross-sectional side view taken along lines 11 C- 11 C of FIG. 11B. FIG. 11D shows a schematic, cross-sectional side view taken along lines 11 D- 11 D of FIG. 11B.

With reference to FIGS. 11A-11D, masking layer 320 preferably has similar properties to those described above with respect to layer 120 .

With reference to FIGS. 11B-11D, layer 330 preferably has similar properties to those described above with respect to layer 130 .

With reference to FIGS. 11B-11D, the fourth temporary layer 340 preferably has similar properties to those described above with respect to the layer 140 .

As with the materials for the layers 120 - 170 , the materials for layers 320 - 340 overlying the substrate 110 are preferably chosen based upon consideration of the chemistry and process conditions for the various pattern forming and pattern transferring steps discussed herein. Such layers are also preferably chosen so that they can be selectively etched relative to other exposed materials.

In the illustrated embodiment of FIGS. 11A-11D, the second selectively definable layer 320 overlies a third hard mask, or etch stop, layer 330 , which overlies a fourth temporary layer 340 , which overlies the level having the stripes 212 and 214 . Underlying levels 160 and 170 , as well as substrate 110 , remain intact. As described above with respect to the layers depicted in FIG. 2, one or more of the layers 320 - 340 can be omitted in some embodiments.

With reference to FIGS. 11A-11D, the second selectively definable layer 320 is preferably formed of a photoresist, including any photoresist known in the art. All the preferred properties and alternatives described above with reference to the layer 120 also apply to the layer 320 .

The third hard mask layer 330 preferably comprises an inorganic material, and in the illustrated embodiment, the layer 330 is a DARC. All the preferred properties and alternatives described above with reference to the layer 130 also apply to the layer 330 .

The fourth temporary layer 340 is preferably formed of amorphous carbon. All the preferred properties and alternatives described above with reference to the layer 140 also apply to the layer 340 . The layer 340 is formed from amorphous carbon in some embodiments. Because it is sometime difficult to achieve good step coverage of amorphous carbon deposition, the underlying striped surface has been planarized (see FIG. 10).

As with the layers 120 - 170 , the thicknesses of the layers 320 - 340 are preferably chosen depending upon compatibility with the etch chemistries and process conditions described herein. Thus, as described above, thicknesses must allow for appropriate pattern transfer, and the hard mask layer 330 is advantageously thin so that its transfer or removal can occur quickly, exposing surrounding materials to less wear.

In the illustrated embodiment, the second selectively definable layer 320 is a photodefinable layer preferably between about 100-250 nm thick and, more preferably, between about 130-200 nm thick. The third hard mask layer 330 is preferably between about 10-30 nm thick and, more preferably, between about 15-25 nm thick. The fourth temporary layer 340 is preferably between about 130-200 nm thick and, more preferably, between about 140-160 nm thick.

Furthermore, the layers 320 , 330 , and 340 can be formed by various methods known to those of skill in the art. For example, the methods described above for forming layers 120 , 130 , and 140 can be used to form layers 320 , 330 , and 340 , respectively.

FIGS. 12A-12D illustrate a pattern formed in the layer 320 , having lines 324 interspersed with spaces 322 . The preferred properties of and methods for forming the lines 124 described above in FIG. 3 et seq. also apply to lines 324 , however, the lines 324 are not parallel to the lines 124 . This can be seen—even though the lines 124 have been removed—by observing that the stripes 212 and the stripes 214 are not parallel to the lines 324 . Thus, because the stripes 212 and 214 are elongate in the same elongate dimension of the lines 124 , the lines 124 and the lines 324 are not parallel.

Because the lines 324 are not parallel to the stripes 212 and 214 , the illustrated method can be said to call for applying a crossing pattern of photoresist over an underlying pattern. Thus, one pattern “crosses” a second pattern when an elongate dimension of the first pattern is not aligned with or parallel to an elongate dimension of the second pattern. The elongate dimension of the lines 124 is aligned with the elongate dimension of the stripes 212 and 214 , but the elongate dimension of the stripes 212 and 214 crosses the elongate dimension of the lines 324 . Thus, the lines 124 can be described as aligned with the stripes 212 and 214 , and the stripes 212 and 214 can be described as crossing the lines 324 . In the illustrated embodiments, the lines 324 not only cross, they cross perpendicularly the stripes 212 and 214 . However, the term “cross” is intended to include all non-parallel angles, not just a 90 degree angle. Thus, though the exemplary features and/or holes formed by the illustrated methods have a generally rectangular footprint (see, e.g., FIGS. 21A, 25 A, and 27 A), other footprints such as skewed quadrangle or diamond-shaped footprints are also contemplated.

With reference to FIGS. 12A-12D, a pattern comprising spaces 322 delimited by definable material features 324 is formed in the second definable layer 320 in a similar way to what was described above with respect to lines 124 and depicted in FIG. 3. Thus, FIGS. 12A-12D show the structure of FIG. 11 after photolithographic patterning of an overlying resist layer. FIG. 12A shows a schematic plan view of the surface. FIG. 12B shows a schematic cross-sectional side view taken along lines 12 B- 12 B of FIG. 12A. FIG. 12C shows a schematic, cross-sectional side view taken along lines 12 C- 12 C of FIG. 12B. FIG. 12D shows a schematic, cross-sectional side view taken along the lines 12 D- 12 D of FIG. 12B.

As with the pattern depicted in FIG. 3, the pattern created by the series of photoresist lines 324 has been formed through conventional photolithography. As with the earlier described pattern, the shrink step can be accomplished to make the lines 324 thinner and spacer formation can be accomplished using the modified lines 324 a as mandrels, or the pattern can be transferred to an underlying layer before the shrink step is accomplished. In the illustrated embodiment described below, however, the shrink step is performed on photoresist lines 324 , the pattern is then transferred to an underlying layer, and portions of the underlying layer form spacer mandrels.

FIGS. 13A-13D show the structure of FIG. 12 after the lines 324 have been shrunk, by an isotropic etch, for example, to create modified lines 324 a . The shrink step also widens the spaces 322 to form modified spaces 322 a. FIG. 13A shows a schematic plan view of the surface. FIG. 13B shows a schematic cross-sectional side view taken along lines 13 B- 13 B of FIG. 13A. FIG. 13C shows a schematic, cross-sectional side view taken along lines 13 C- 13 C of FIG. 13B. FIG. 13D shows a schematic, cross-sectional side view taken along lines 13 D- 13 D of FIG. 13B.

The structure of FIGS. 13A-13D preferably shares many characteristics of the features described in conjunction with FIG. 4. Similar methods to achieve that structure can also be used; preferred etch materials and methods, and desirable configurations are described above. For example, the photoresist lines 324 are preferably reduced in size using an isotropic etch, such as a sulfur oxide plasma, e.g., a plasma comprising SO ₂ , O ₂ , N ₂ and Ar, or any other suitable plasma. Two other plasmas that can be used, for example, are an HBr/O ₂ plasma or a Cl ₂ /O ₂ plasma.

As with the lines 124 a , the modified lines 324 a define the dimensions of the placeholders or mandrels along which a pattern of spacers will be formed. The alternatives described above also apply here. For example, in alternative embodiments, the pattern of the lines 324 can be transferred to underlying layers without first being trimmed or having their width's reduced as described above. In such embodiments, a pattern corresponding to that of lines 324 can be formed in the temporary layer 340 and the features of that pattern can be reduced in width with a shrink step. In other alternative embodiments, if the deposition and etching of spacer material is compatible with the definable layer 320 , the temporary layer 340 can be omitted and the spacer material can be deposited directly on the photo-defined lines 324 or the thinner lines 324 a.

In the illustrated embodiment, lines 324 a create a mask for placeholders or mandrels that will later be formed in the underlying layer 340 , along which a pattern of spacers 382 (FIG. 17) will be formed after blanket deposition of a spacer material 380 (FIG. 16).

FIGS. 14A-14D illustrate how the pattern in the photodefinable layer 320 can be extended into the fourth temporary layer 340 . FIG. 14A shows a schematic plan view of the surface. FIG. 14B shows a schematic cross-sectional side view taken along lines 14 B- 14 B of FIG. 14A. FIG. 14C shows a schematic, cross-sectional side view taken along lines 14 C- 14 C of FIG. 14B. FIG. 14D shows a schematic, cross-sectional side view taken along lines 14 - 14 D of FIG. 14B.

The fourth temporary layer 340 preferably has the advantageous properties described above for the second temporary layer 140 such as high heat resistance. As shown in FIGS. 14A-14D, the pattern of lines 324 a and spaces 322 a in FIGS. 13A-13D can be extended into or transferred to underlying layers in a similar way to the way the pattern of lines 124 a and spaces 122 a was transferred to underlying layers, using, for example, a selective etch to transfer the pattern into the hard mask layer 330 and an SO ₂ -containing anisotropic plasma etch to transfer the pattern into the fourth temporary layer 340 . Preferred and alternative etch chemistries are described above.

As illustrated in FIG. 14A, the described etch steps remove the portions of the layers 330 and 340 that are not masked by the lines 324 a , thus leaving portions of the stripes 212 and 214 exposed. The surfaces visible in FIG. 14A have been hatched to reveal the underlying materials of the structure depicted, and to show how the lines 324 a cross the stripes 212 and 214 .

FIGS. 15A-15D show the structure of FIG. 14 after the remaining portions of the overlying layers 320 and 330 have been stripped. Such a process is described above and illustrated in FIGS. 5-6. FIG. 15A shows a schematic plan view of the surface. FIG. 15B shows a schematic cross-sectional side view taken along lines 15 B- 15 B of FIG. 15A. FIG. 15C shows a schematic, cross-sectional side view taken along lines 15 C- 15 C of FIG. 15B. FIG. 15D shows a schematic, cr