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Match Document Document Title
7466907 Annealing process and device of semiconductor wafer  
A device for use in a thermal annealing process for a wafer (T) of material chosen among the semiconductor materials for the purpose of detaching a layer from the wafer at an weakened zone. During...
7453051 System and process for heating semiconductor wafers by optimizing absorption of electromagnetic energy  
An apparatus for heat treating semiconductor wafers is disclosed. The apparatus includes a heating device which contains an assembly linear lamps for emitting light energy onto a wafer. The linear...
7442900 Chamber for uniform heating of large area substrates  
Embodiments of the present invention generally provide an apparatus for providing a uniform thermal profile to a plurality of large area substrates during thermal processing. In one embodiment, an...
7432475 Vertical heat treatment device and method controlling the same  
A vertical heat processing apparatus includes a process chamber ( 5 ) defining a process field (A 1 ) configured to accommodate a plurality of target substrates (W) supported at intervals in a...
7431585 Apparatus and method for heating substrates  
An apparatus for processing substrates is disclosed. In one embodiment, the apparatus includes a housing and a plurality of stacked cell structures in the housing. An actuator is adapted to move...
7429718 Heating and cooling of substrate support  
A substrate support assembly and method for controlling the temperature of a substrate within a process chamber are provided. A substrate support assembly includes an thermally conductive body...
7429717 Multizone heater for furnace  
The present invention relates to an apparatus and method for heating a semiconductor processing chamber. One embodiment of the present invention provides a furnace for heating a semiconductor...
7416405 Vertical type of thermal processing apparatus and method of using the same  
A vertical type of thermal processing apparatus of the present invention includes a thermal processing furnace having a furnace opening at a lower portion thereof. A boat holding objects to be...
7415312 Process module tuning  
A process module tuning method characterizes a process module by gathering data using a process condition measuring device to measure process outputs while inputs are excited. The data is used to...
7414224 Backside rapid thermal processing of patterned wafers  
Apparatus and methods of thermally treating a wafer or other substrate, such as rapid thermal processing (RTP) apparatus and methods are disclosed. An array of radiant lamps directs radiation to...
7387762 Apparatus for sintering silver clay  
A sintering apparatus for silver clay wherein a silver clay composition can be readily and easily sintered by exposing a silver clay composition obtained by molding to a flame of a solid alcohol fuel.
7381928 Thermal processing apparatus and thermal processing method  
A light source including a plurality of flash lamps emits flashes thereby flash-heating a semiconductor wafer held by a thermal diffuser and a hot plate. The current distance of irradiation between...
7378618 Rapid conductive cooling using a secondary process plane  
A method and apparatus for thermally processing a substrate is described. The apparatus includes a substrate support configured to move linearly and/or rotationally by a magnetic drive. The...
7371998 Thermal wafer processor  
A thermal processor may include a cooling jacket positionable around a process chamber within a process vessel or jar. A heater can move into a position substantially between the process chamber...
7371997 Thermal processing apparatus and thermal processing method  
In a thermal processing apparatus, using a lamp for heating a substrate, an opening is formed for a camera unit, which is used to image portions of an auxiliary ring supporting the substrate, to...
7358462 Apparatus and method for reducing stray light in substrate processing chambers  
A method and apparatus for heating semiconductor wafers in thermal processing chambers is disclosed. The apparatus includes a non-contact temperature measurement system that utilizes radiation...
7358200 Gas-assisted rapid thermal processing  
A system, method and apparatus for processing a semiconductor device including a processing chamber and a heating assembly positioned within the processing chamber. The heating assembly including...
7351936 Method and apparatus for preventing baking chamber exhaust line clog  
A method and apparatus involve providing a supply of nitrogen gas, heating the supply of nitrogen gas to a temperature, and ejecting the heated nitrogen gas through the exhaust line of the baking...
7332691 Cooling plate, bake unit, and substrate treating apparatus  
A bake unit includes a cooling plate for cooling a substrate and a lift pin assembly for loading a substrate on the cooling plate. When a wafer is cooled on the cooling plate, a guide groove is...
RE40052 Heat treatment apparatus  
A heat treatment table is divided into two or more regions, a heater is disposed for each region. On a predetermined portion of the heat treatment table, a plurality of sensors are disposed...
7323661 Heat treatment apparatus using a lamp for rapidly and uniformly heating a wafer  
A heat treatment apparatus enables a rapid temperature rise of an object to be processed while giving an excellent economical efficiency. A heating unit heats an object to be heated by irradiating...
7317175 User interface for configuring and controlling an array of heater elements  
An oven control system and user interface are provided for setting a target temperature for different zones within an oven. A thermocouple is provided in each zone within the oven to monitor the...
7317172 Bake system  
Provided is a bake system. The bake system includes a heating plate having a heating plate having a substrate on an upper surface. A case is disposed below the heating plate to support the heating...
7312422 Semiconductor batch heating assembly  
A heat treatment apparatus for use in batch heating/wafer processing is provided, which comprises a process chamber for receiving a wafer boat, at least a heating element comprising a substrate...
7311520 Heat treatment apparatus  
The present invention is a thermal processing unit including: a heating-furnace body whose upper end has an opening; a reaction tube consisting of a single tube contained in the heating-furnace...
7274006 Heater  
A heater includes a heating member formed in a plate shape that includes a substrate-heating surface on which a substrate is mounted and a heating member rear surface which is on the opposite side...
7265962 Electrostatic chuck and production method therefor  
The present invention provides an electrostatic chuck comprising a substrate, a dielectric layer formed by thermal spraying on an upper face of the substrate, an internal electrode embedded in the...
7262390 Apparatus and adjusting technology for uniform thermal processing  
An adjusting technology of thermal processing is provided. A heating lamp and a reflector are disposed over a wafer and the heat flux distribution on the wafer generated by the individual heating...
7256370 Vacuum thermal annealer  
A vacuum thermal annealing device is provided having a temperature control for use with various materials, such as semiconductor substrates. A vacuum is used to remove air and outgas residual...
7250094 Heat treatment apparatus  
A processing gas is prevented from entering into a space below a placement table. A supporting surface for supporting the lower face of a placement table is provided at an inner circumferential...
7241140 Burning oven  
A burning oven is provided, and has a housing that surrounds a combustion chamber in which material that is to be burned can be introduced after the housing is opened and can be placed upon a...
7211769 Heating chamber and method of heating a wafer  
A heating chamber which can be used during a reflow process to form a metal wiring having a multi-layered writing structure and a method of heating a wafer using the same, are provided. The heating...
7211152 Heating element CVD system and connection structure between heating element and electric power supply mechanism in the heating element CVD system  
A heating element CVD system wherein one or a plurality of connection terminal holders is placed in the processing container, and each of the connection terminal holders holds a plurality of...
7202448 Device for firing ceramic for dental prostheses  
A heating muffle for a muffle kiln for the production of a dental ceramic product containing titanium, which comprises a hollow unit, which is provided with at least one opening for the uptake of...
7180035 Substrate processing device  
A steam generator 40 ′ provided in a substrate processing apparatus includes a tank 301 having a hollow cylindrical member 302 formed of a composite of PTFE and PFA and a pair of side wall...
7179416 Heat treatment apparatus  
In a heat treatment apparatus, the direction of the magnetic field generated by the magnetic field generating device in the region in which the object of treatment is heat-treated and the conveying...
7173216 LED heat lamp arrays for CVD heating  
A reactor chamber is positioned between a top array of LED heat lamps and a bottom array of LED heat lamps. The LED heat lamps forming the top and bottom arrays are individually or controllable in...
7157666 Systems for producing semiconductors and members therefor  
A member provided around a susceptor for mounting a semiconductor in a chamber of a semiconductor production system. The member has a face opposing the susceptor and a center line average surface...
7145104 Silicon layer for uniformizing temperature during photo-annealing  
An apparatus and method for uniformizing the temperature distribution across a semiconductor wafer during radiation annealing of process regions formed in the wafer is disclosed. The method...
7141763 Method and apparatus for rapid temperature change and control  
An apparatus and a method for controlling the temperature of a substrate during substrate processing. The apparatus comprises a substrate table having a thermal surface supporting the substrate....
7138608 Sealed line structure for use in process chamber  
A sealed line structure equipped with a heater block for a process chamber for use in manufacturing a semiconductor device is provided. The structure includes a housing member, a movement...
7138607 Determining method of thermal processing condition  
The invention is a method of determining a set temperature profile of a method of controlling respective substrate temperatures of plurality of groups in accordance with respective corresponding...
7138606 Wafer processing method  
A wafer processing method for use with a wafer processing apparatus having a liquid cooling jacket with a built-in coolant liquid circulation path and a ceramic plate as attached onto the liquid...
7135656 Apparatus and method for reducing stray light in substrate processing chambers  
A method and apparatus for heating semiconductor wafers in thermal processing chambers. The apparatus includes a non-contact temperature measurement system that utilizes radiation sensing devices,...
7126092 Heater for wafer processing and methods of operating and manufacturing the same  
A heater for wafer processing, such as thin film deposition, includes a first heating unit and a second heating unit. The first heating unit includes a substrate with a top surface for supporting a...
7126087 Method of effecting heating and cooling in reduced pressure atmosphere  
A method of effecting high temperature vacuum heating and cooling suitable for conducting heat treatment to be performed on components used in a display apparatus. The heating/cooling method...
7115837 Selective reflectivity process chamber with customized wavelength response and method  
A customizable chamber spectral response is described which can be used at least to tailor chamber performance for wafer heating, wafer cooling, temperature measurement, and stray light. In one...
7112763 Method and apparatus for low temperature pyrometry useful for thermally processing silicon wafers  
A rapid thermal processing (RTP) system including a transmission pyrometer monitoring the temperature dependent absorption of the silicon wafer for radiation from the RTP lamps at a reduced power...
7110665 Thermal treatment equipment, thermal treatment method and manufacturing method of image display apparatus  
In an apparatus for performing heating treatment of a structure composed of a substrate and a structure arranged on the front surface of the substrate, the latter structure having thermal capacity...
7109443 Multi-zone reflecting device for use in flash lamp processes  
A method, apparatus, and system including a reflecting device having a plurality of reflecting zones with associated reflectivities for reflecting light from a flash lamp, are described herein.
Matches 1 - 50 out of 823 1 2 3 4 5 6 7 8 9 10 11 12 13 14 15 >