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7473915 System and method to pattern an object through control of a radiation source  
A radiation source for use in lithography. The radiation source comprising a pn-junction disposed on a substrate that can be reverse-biased to cause avalanche breakdown and emission of UV or DUV...
7473912 Method and apparatus for patterning micro and nano structures using a mask-less process  
According to a specific embodiment of the present invention, a mask-less lithography method and apparatus is provided. The apparatus includes an integrated write head on a slider with an air...
7473909 Use of ion induced luminescence (IIL) as feedback control for ion implantation  
An ion implantation system utilizing detected ion induced luminescence as feedback control that comprises, a wafer, a spectrometer, a photodetector, an ion source generator, wherein the ion source...
7473908 Getter and cleaning arrangement for a lithographic apparatus and method for cleaning a surface  
A lithographic apparatus includes a radiation source and an object with a first surface which is configured to retain metal contaminants. This surface has the function of a getter. The first...
7473907 Illumination system for a wavelength of ≦ 193 nm, with sensors for determining an illumination  
There is provided an illumination system that includes (a) a light source that emits light having a wavelength ≦193 nm, where the light provides a predetermined illumination in a plane distant...
7473866 Laser processing apparatus  
A laser processing apparatus comprising a chuck table, laser beam irradiation means for irradiating a workpiece held on the chuck table with a laser beam, and processing feed means for...
7471371 Exposure apparatus and device fabrication method  
This exposure system projects a pattern image onto a substrate via a projection optical system and a liquid to expose the substrate, with a space between the projection optical system and the...
7470919 Substrate support assembly with thermal isolating plate  
Embodiments of the invention generally provide a substrate support assembly. In one embodiment, a substrate support assembly includes a substrate support plate, a thermal regulating plate coupled...
7468521 Lithographic apparatus and device manufacturing method  
A lithographic apparatus includes a radiation system for providing a beam of radiation. The radiation system includes at least one of a contaminant trap for trapping material emanating from the...
7465946 Alternative fuels for EUV light source  
An EUV light source is disclosed which may comprise at least one optical element having a surface, such as a multi-layer collector mirror; a laser source generating a laser beam; and a source...
7465945 Method and apparatus for processing a micro sample  
An object of the invention is to realize a method and an apparatus for processing and observing a minute sample which can observe a section of a wafer in horizontal to vertical directions with high...
7465943 Controlling the flow through the collector during cleaning  
A lithographic apparatus includes a collector configured to collect radiation from a radiation source, the collector including a plurality of shells forming separate compartments, and a cleaning...
7465935 Method for inspecting pattern defect and device for realizing the same  
When using a CCD sensor as a photo-detector in a device for inspecting foreign matters and defects, it has a problem of causing electric noise while converting the signal charge, produced inside by...
7462850 Radical cleaning arrangement for a lithographic apparatus  
A cleaning arrangement is configured to clean an EUV optic of an EUV lithographic apparatus. The partial radical pressure ranges between 0.1-10 Pa. The cleaning arrangement can be configured inside...
7462848 Optics for generation of high current density patterned charged particle beams  
A direct-write electron beam lithography system employing a patterned beam-defining aperture to enable the generation of high current-density shaped beams without the need for multiple beam-shaping...
7462846 Apparatus for measuring a position of an ion beam profiler and a method for its use  
In an embodiment, an ion beam profiler center measuring apparatus is releasably mounted to the ion beam profiler and measures a center position of an ion beam profiler using a laser beam. Accurate...
7462843 Apparatus and methods for ion beam implantation  
This invention discloses an ion implantation apparatus with multiple operating modes. It has an ion source and an ion extraction means for extracting a ribbon-shaped ion beam therefrom. The ion...
7462842 Device, EUV lithographic device and method for preventing and cleaning contamination on optical elements  
The invention relates to a method for preventing contamination on the surfaces of optical elements comprising a multi-layer system, during the exposure thereof to radiation at signal wave lengths...
7462841 Lithographic apparatus, device manufacturing method, and use of a radiation collector  
A lithographic apparatus, comprising a collector being constructed to receive radiation from a radiation source and transmit radiation to an illumination system, wherein the collector is provided...
7459705 Charged particle beam exposure method of character projection system, charged particle beam exposure device of character projection system, program for use in charged particle beam exposure device, and manufacturing method of semiconductor device  
A charged particle beam exposure method is disclosed, which includes preparing an aperture mask having character apertures, correcting dimensions of designed patterns in design data in...
7459704 Ion source configuration for production of ionized clusters, ionized molecules and ionized mono-atoms  
Ion sources and methods for generating molecular ions in a cold operating mode and for generating atomic ions in a hot operating mode are provided. In some embodiments, first and second electron...
7459702 Apparatus and method for polishing gemstones and the like  
The invention comprises a two-step process for achieving an ultra-polish finish on materials such as gemstones and the like by first performing a chemical-mechanical polishing of the material using...
7459701 Stage apparatus, lithographic apparatus and device manufacturing method  
A stage apparatus for displacing an object having a substantially flat surface is described. The apparatus includes an object table for supporting the object and a positioning device for displacing...
7459699 Method of determining processing position in charged particle beam apparatus, and infrared microscope used in the method  
A laser mark which will be the positioning mark for a secondary charged particle image in the charged particle beam apparatus is applied by moving the sample processing/observation area in the...
7459683 Charged particle beam device with DF-STEM image valuation method  
There is disclosed a charged particle beam device which judges whether or not an image based on a dark-field signal has an appropriate atomic number contrast. Input reference information, a...
7456408 Illumination system particularly for microlithography  
There is provided an illumination system for microlithography. The illumination system includes an optical element having a plurality of field raster elements, a plane in which a field is...
RE40586 Reduced striae extreme ultra violet elements  
Titania-containing silica glass bodies and extreme ultraviolet elements having low levels of striae are disclosed. Methods and apparatus for manufacturing and measuring striae in glass elements and...
7453074 Ion implanter with ionization chamber electrode design  
An ion implanter includes an ion source for generating an ion beam moving along a beam line and a vacuum or implantation chamber wherein a workpiece, such as a silicon wafer is positioned to...
7453072 Method for depositing a film using a charged particle beam, method for performing selective etching using the same, and charged particle beam equipment therefor  
Certain film deposition and selective etching technology may involve scanning of a charged particle beam along with a deposition gas and etching gas, respectively. In conventional methods,...
7453071 Contamination barrier and lithographic apparatus comprising same  
A rotatable contamination barrier is disclosed that has a plurality of closely packed blades configured to trap contaminant material coming from a radiation source. The blades are radially oriented...
7453063 Calibration substrate and method for calibrating a lithographic apparatus  
A calibration substrate for use during calibration of a lithographic apparatus is disclosed. The calibration substrate includes a first substantially flat surface, a second substantially flat...
7453059 Technique for monitoring and controlling a plasma process  
A time-of-flight ion sensor for monitoring ion species in a plasma includes a housing. A drift tube is positioned in the housing. An extractor electrode is positioned in the housing at a first end...
7449700 Electron beam exposure apparatus, electron beam exposure method and method of manufacturing semiconductor device  
An electron beam exposure apparatus has a first shaping aperture having a plurality of rectangular openings, each having sizes different from each other and shaping a beam shape of an electron...
7449699 Method and apparatus for creating a topography at a surface  
Methods and apparatus whereby an optical interferometer is utilized to monitor and provide feedback control to an integrated energetic particle column, to create desired topographies, including the...
7446325 Reflector for generating a neutral beam and substrate processing apparatus including the same  
Example embodiments of the present invention provide a reflector for generating a neutral beam and a substrate processing apparatus including the same. The reflector may include at least one...
7442944 Ion beam implant current, spot width and position tuning  
An ion beam tuning method, system and program product for tuning an ion implanter system are disclosed. The invention obtains an ion beam profile of the ion beam by, for example, scanning the ion...
7442924 Repetitive circumferential milling for sample preparation  
A method of sample extraction entails making multiple, overlapping cuts using a beam, such as a focused ion beam, to create a trench around a sample, and then undercutting the sample to free it....
7439530 LPP EUV light source drive laser system  
An apparatus and method is disclosed which may comprise a laser produced plasma EUV system which may comprise a drive laser producing a drive laser beam; a drive laser beam first path having a...
7439525 Demagnification measurement method for charged particle beam exposure apparatus, stage phase measurement method for charged particle beam exposure apparatus, control method for charged particle beam exposure apparatus, and charged particle beam exposure apparatus  
A method for measuring a demagnification of a charged particle beam exposure apparatus includes measuring a first stage position of a mask stage in accordance with a mask stage coordinate system,...
7439502 Electron beam apparatus and device production method using the electron beam apparatus  
The purpose of the invention is to provide an improved electron beam apparatus with improvements in throughput, accuracy, etc. One of the characterizing features of the electron beam apparatus of...
7435978 System, method and a program for correcting conditions for controlling a charged particle beam for lithography and observation, and a program and method for manufacturing a semiconductor device  
A system for correcting a charged particle beam lithography condition including: an error calculation unit configured to calculate an error in an illumination position of a charged particle beam,...
7435977 Ion beam angle measurement systems and methods for ion implantation systems  
Angle of incidence measurements along an axis of ion implantation are obtained by employing positive and negative slot structures. The positive slot structures have entrance openings, exit...
7435973 Material processing system and method  
A material processing system for processing a work piece is provided. The material processing is effected by supplying a reactive gas and energetic radiation for activation of the reactive gas to a...
7435960 Charged particle beam apparatus  
A charged particle beam apparatus obtains an image by detecting a generation signal inclusively indicative of secondary electrons generated from a specimen. The apparatus has an input unit for...
7435956 Apparatus and method for inspection and testing of flat panel display substrates  
A charged particle optical system for testing, imaging or inspecting substrates comprises: a charged particle optical assembly configured to produce a line of charged particle beams equally spaced...
7432513 Gas shower, lithographic apparatus and use of a gas shower  
A gas shower to condition at least one optical path in an optical apparatus, wherein the gas shower includes a gas distribution chamber having a shower outlet side to supply gas to the optical...
7429740 Electric-magnetic field-generating element and assembling method for same  
An electric-magnetic field-generating element and a multipole element comprising a plurality of these field-generating elements providing for a stable charged particle beam are described. For some...
7427765 Electron beam column for writing shaped electron beams  
An electron beam column comprises a thermal field emission electron source to generate an electron beam, an electron beam blanker, a beam shaping module, and electron beam optics comprising a...
7427764 Laser crystallization apparatus and laser crystallization method  
A laser crystallization apparatus which capable of correcting both shift in imaging position caused by thermal lens effect of the imaging optical system and shift due to flatness of the substrate...
7425715 Digital parallel electron beam lithography stamp  
An array of vertically aligned electron emitting nanotips such as multiwall carbon nanotubes are formed for use as a lithographic stamp. Crosswire addressing is used to generate electron emission...
Matches 1 - 50 out of 86 1 2 >