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Match Document Document Title
7473917 Lithographic apparatus and method  
A lithographic apparatus is provided with a measurement apparatus constructed and arranged to use surface plasmon resonance to detect contamination of a surface within the lithographic apparatus.
7473916 Apparatus and method for detecting contamination within a lithographic apparatus  
A lithographic apparatus that includes at least one optical surface exposed to a radiation beam, and a surface plasmon resonance measurement apparatus adjacent the optical surface that is...
7473915 System and method to pattern an object through control of a radiation source  
A radiation source for use in lithography. The radiation source comprising a pn-junction disposed on a substrate that can be reverse-biased to cause avalanche breakdown and emission of UV or DUV...
7473914 System and method for producing terahertz radiation  
An apparatus for producing an annular electron beam comprises a cathode for generating electrons, a cavity having an annular shape and operable to receive the electrons, an energy input coupled to...
7473908 Getter and cleaning arrangement for a lithographic apparatus and method for cleaning a surface  
A lithographic apparatus includes a radiation source and an object with a first surface which is configured to retain metal contaminants. This surface has the function of a getter. The first...
7473907 Illumination system for a wavelength of ≦ 193 nm, with sensors for determining an illumination  
There is provided an illumination system that includes (a) a light source that emits light having a wavelength ≦193 nm, where the light provides a predetermined illumination in a plane distant...
7470921 Light-emitting diode device  
A UV LED device may be used for curing fluids. In one embodiment, LEDs are positioned on faces defined by an inverted recess in a base portion. The LEDs are configured such that the light beams...
7468521 Lithographic apparatus and device manufacturing method  
A lithographic apparatus includes a radiation system for providing a beam of radiation. The radiation system includes at least one of a contaminant trap for trapping material emanating from the...
7465946 Alternative fuels for EUV light source  
An EUV light source is disclosed which may comprise at least one optical element having a surface, such as a multi-layer collector mirror; a laser source generating a laser beam; and a source...
7465943 Controlling the flow through the collector during cleaning  
A lithographic apparatus includes a collector configured to collect radiation from a radiation source, the collector including a plurality of shells forming separate compartments, and a cleaning...
7462851 Electromagnetic radiation source, lithographic apparatus, device manufacturing method and device manufactured thereby  
A device for generating radiation source based on a discharge includes a cathode and an anode. A discharge is created in a material comprising an alloy of two or more substances.
7462850 Radical cleaning arrangement for a lithographic apparatus  
A cleaning arrangement is configured to clean an EUV optic of an EUV lithographic apparatus. The partial radical pressure ranges between 0.1-10 Pa. The cleaning arrangement can be configured inside...
7462849 Sterilizing lamp  
The invention relates to a UV-C sterilizing lamp for the treatment of a medium with UV-C radiation in order to kill the microorganisms contained therein by means of at least one UV-C emitter ( 2 )....
7462841 Lithographic apparatus, device manufacturing method, and use of a radiation collector  
A lithographic apparatus, comprising a collector being constructed to receive radiation from a radiation source and transmit radiation to an illumination system, wherein the collector is provided...
7462574 Silica glass containing TiO2 and optical material for EUV lithography  
A silica glass containing TiO 2 , characterized in that the fluctuation of the refractive index (Δn) is at most 2×10 −4 within an area of 30 mm×30 mm in at least one plane. A silica glass...
7460646 Device for and method of generating extreme ultraviolet and/or soft-x-ray radiation by means of a plasma  
A method for generating extreme ultraviolet and/or soft X-ray radiation by a plasma that can be generated through irradiation of a material. In order to obtain a reduction in the contamination of...
7459708 Extreme UV radiation source device and method for eliminating debris which forms within the device  
To suppress the adherence of debris as a result of a radiating fuel, such as tin or the like, within a vessel for forming high density and high temperature plasma of an extreme UV radiation source...
7459707 Exposure apparatus, light source apparatus and device fabrication  
An exposure apparatus for exposing a pattern of a mask onto an object, said exposure apparatus includes a light source for generating a plasma, said light source including a condenser mirror that...
7456417 Laser plasma EUV light source, target material, tape material, a method of producing target material, a method of providing targets, and an EUV exposure device  
Target 1 that is arranged in the disc direction is sprayed from nozzle 2 that has a slit-shaped aperture. Target 1 is conveyed on a gas stream. He gas is used in this example. Nozzle 2 may...
7456416 Plug-in radiation source module for a weathering apparatus  
A plug-in radiation source module ( 10 ) for mounting and locating a radiation source ( 3 ) for a weathering apparatus ( 20 ), the plug-in module ( 10 ) being configured to be insertable from...
7456408 Illumination system particularly for microlithography  
There is provided an illumination system for microlithography. The illumination system includes an optical element having a plurality of field raster elements, a plane in which a field is...
7453077 EUV light source  
An EUV light source and method of operating same is disclosed which may comprise: an EUV plasma production chamber comprising a chamber wall comprising an exit opening for the passage of produced...
7453071 Contamination barrier and lithographic apparatus comprising same  
A rotatable contamination barrier is disclosed that has a plurality of closely packed blades configured to trap contaminant material coming from a radiation source. The blades are radially oriented...
7449704 EUV light source  
An EUV light source apparatus and method for producing EUV light, which includes a plasma generation chamber for generating EUV plasma; an EUV light collector having a reflective portion irradiated...
7449703 Method and apparatus for EUV plasma source target delivery target material handling  
An EUV target delivery system and method are disclosed which may comprise: a target material purification system connected to deliver liquid target material comprising: a first container and a...
7446329 Erosion resistance of EUV source electrodes  
Erosion of material in an electrode in a plasma-produced extreme ultraviolet (EUV) light source may be reduced by treating the surface of the electrode. Grooves may be provided in the electrode...
7443948 Illumination system particularly for microlithography  
There is provided an illumination system. the illumination system includes (a) a source of light having a wavelength of less than or equal to 193 nm, and (b) an optical element in a path of the...
7442948 Contamination barrier and lithographic apparatus  
A rotatable contamination barrier is disclosed. The barrier includes a plurality of closely packed blades for trapping contaminant material coming from an EUV radiation source. The blades are...
7439530 LPP EUV light source drive laser system  
An apparatus and method is disclosed which may comprise a laser produced plasma EUV system which may comprise a drive laser producing a drive laser beam; a drive laser beam first path having a...
7435982 Laser-driven light source  
An apparatus for producing light includes a chamber and an ignition source that ionizes a gas within the chamber. The apparatus also includes at least one laser that provides energy to the ionized...
7433447 X-ray generator and exposure apparatus  
An X-ray generator for generating plasma and X-ray emitted from the plasma includes a unit for generating the plasma, and plural reflection optical systems for introducing the X-ray through...
7432517 Pulse modifier, lithographic apparatus, and device manufacturing method  
A pulse modifying unit is provided in the illumination system of the lithographic apparatus to reduce the degradation of the expensive lens elements by billions of the high intensity ultraviolet...
7429546 Silica glass containing TiO2 and process for its production  
A silica glass containing TiO 2 , which has a fictive temperature of at most 1,200° C., a F concentration of at least 100 ppm and a coefficient of thermal expansion of 0±200 ppb/° C. from 0 to...
7427766 Method and apparatus for producing extreme ultraviolet radiation or soft X-ray radiation  
A method of producing extreme ultraviolet radiation (EUV) or soft X-ray radiation by means of an electrically operated discharge, in particular for EUV lithography or for metrology, in which a...
7425718 Lighting system, point source lights therefor and methods of making the same  
A lighting system comprising at least one lighting assembly, the lighting assembly comprising at least one ultraviolet light source, means for separately controlling ultraviolet light source and a...
7423275 Erosion mitigation for collector optics using electric and magnetic fields  
A magnetic and/or electric field may be generated around collector optics in an EUV lithography system to deflect debris particles from the reflective surfaces of the optics. The magnetic and/or...
7420191 Discharge radiation source, in particular UV radiation  
The invention concerns a radiation source, comprising an anode ( 2 ), a cathode ( 3 ), an electric discharge gap ( 4 ) between the anode ( 2 ) and the cathode ( 3 ) and a gas input conduit ( 30 )...
7414253 EUV radiation source with high radiation output based on a gas discharge  
The invention is directed to an arrangement for generating EUV radiation based on a gas discharge plasma with high radiation emission in the range between 12 nm and 14 nm. It is the object of the...
7414251 Method for providing an operable filter system for filtering particles out of a beam of radiation, filter system, apparatus and lithographic apparatus comprising the filter system  
A method for providing an operable filter system for filtering particles out of a beam of radiation in lithography is disclosed. The method includes providing a slack foil or wire for intercepting...
7411203 EUV light source  
An apparatus and method for EUV light production is disclosed which may comprise a laser produced plasma (“LPP”) extreme ultraviolet (“EUV”) light source control system comprising a target...
7411202 Irradiating apparatus  
An irradiating apparatus includes a support member and a reflector supported by the support member to define a concave light energy reflector surface. A light source of radiating energy is disposed...
7408179 Transition radiation apparatus and method therefor  
In one embodiment of the present invention, intervening material layers ( 208 ) are recessed ( 304 ) relative to membrane layers ( 208 ) thereby providing increased surface area contact between the...
7405417 Lithographic apparatus having a monitoring device for detecting contamination  
A lithographic apparatus is disclosed. The apparatus includes a projection system configured to project a first radiation beam onto a target portion of a substrate, and at least one monitoring...
7405416 Method and apparatus for EUV plasma source target delivery  
An EUV plasma formation target delivery system and method is disclosed which may comprise: a target droplet formation mechanism comprising a magneto-restrictive or electro-restrictive material, a...
7402825 LPP EUV drive laser input system  
A laser produced plasma (“LPP”) extreme ultraviolet (“EUV”) light source and method of operating same is disclosed which may comprise an EUV plasma production chamber having a chamber wall;...
7402818 Tactical integrated illumination countermeasure system  
A method for generating visible light and a deceptive signature pattern for an emissions producing asset is disclosed. The method comprises illuminating at least one lighting assembly of the asset...
7399982 UV curing system and process with increased light intensity  
A special method is provided for more uniformly and quickly curing products with a scratch-resistant UV curable coating or UV curable printing thereon with high intensity UV light, such as for...
7399981 Apparatus for generating light in the extreme ultraviolet and use in a light source for extreme ultraviolet lithography  
The device comprises a device ( 2 ) for creating an essentially linear target ( 4 ) in an evacuated space where laser beams ( 1 ) are focused, the target being suitable for interacting with the...
7399979 Exposure method, exposure apparatus, and method for producing device  
An exposure system includes an exposure part for irradiating a resist film formed on a substrate with exposing light through a mask with a liquid provided on the resist film. The system also...
7399967 Rapidly flashing thermal image beacon  
A system comprised of a one or more rapidly flashing thermal image beacons, a plurality of sensors, a control subsystem, input means, and a power source. Each beacon being comprised of a precision...
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