Matches 601 - 650 out of 51843 < 6 7 8 9 10 11 12 13 14 15 16 17 18 19 20 >
Match Document Document Title
7270594 Polishing apparatus  
A polishing apparatus has a polishing table ( 12 ) with a polishing surface ( 10 ) attached thereon, and a top ring ( 20 ) for pressing a workpiece (W) against the polishing surface ( 10 ). The top...
7270593 Light beam targeting and positioning system for a paint or coating removal blasting system  
A blasting system for the removal of coatings or paint from an underlying surface uses an optical device to position the blasting nozzle an appropriate stand-off distance from the surface. The...
7270592 Milling machine  
The improved milling machine makes use of individually controlled x-axis, y-axis, and z-axis carriages. These carriages provide positive and precise control of the position of the cutting tools and...
7270591 Electric sander and motor control therefor  
A hand held orbital sander has a housing having an electronically commutated motor disposed therein and an orbit mechanism disposed beneath the housing. A motor controller is coupled to the motor....
7268281 Apparatus for abrading a reed used in a musical instrument  
An apparatus for abrading a reed for a musical instrument comprises: a base having two top surfaces tilted toward each other and having tapered parallel tracks in its side edge surfaces; and a...
7267841 Method for manufacturing single-sided sputtered magnetic recording disks  
An information-storage media is provided that includes: (a) a substrate disk 312 having first and second opposing surfaces; (b) a first interface layer 304 on the first surface, the...
7267610 CMP pad having unevenly spaced grooves  
A chemical mechanical polishing pad ( 100 ) having a circular polishing track ( 124 ) and a concentric center ( 116 ). The polishing pad ( 100 ) includes a polishing layer ( 104 ) having a groove...
7267609 Dual purpose sanding and collecting abrading device  
A dual purpose abrading device for smoothing, sanding or finishing a surface of an object while simultaneously surrounding, collecting and containing the particles or debris as they are being...
7267608 Method and apparatus for conditioning a chemical-mechanical polishing pad  
A conditioner including abrasive elements for conditioning a polishing pad to be used in abrasive semiconductor substrate treatment processes, such as chemical-mechanical polishing or...
7267607 Transparent microporous materials for CMP  
The invention is directed to a chemical-mechanical polishing pad substrate comprising a microporous closed-cell foam characterized by a narrow pore size distribution in the range of about 0.01...
7267605 Method and apparatus for abrasive recycling and waste separation system  
The present invention provides a method of handling abrasive solids materials used in an abrasive cutting procedure which jets a high-pressure abrasive slurry through a nozzle ( 7 ) onto a work...
7267604 Grinding abrasive grains, abrasive, abrasive solution, abrasive solution preparation method, grinding method, and semiconductor device fabrication method  
Abrasive grains have mainly grains with a roundness of 0.50 or more and 0.75 or less, where the roundness is defined as the ratio of the circumference of a circle having the same area as that of a...
7267603 Back grinding methods for fabricating an image sensor  
Back grinding methods for fabricating an image sensor are disclosed. An example method of back grinding an image sensor comprises: forming a profile anti-deformation film on a micro lens of the...
7267602 Seal assembly manufacturing methods  
Finishing a seal assembly as a unit is proposed, which prevents alignment of the end gaps of the annular body and the annular ring of the seal assembly, provides the ability to manufacture the seal...
7267601 Method of producing polishing cloth  
A polishing cloth to be produced has a surface layer stacked over a base material. The surface layer is made of a foamed layer and a non-foamed layer, the foamed layer including air bubble cells...
7267600 Polishing apparatus  
Apparatus for polishing are provided. An apparatus comprises a fluid controller, a polishing apparatus and a fluid interface membrane. The fluid controller is fluidly coupled to the polishing...
7266881 Method of manufacturing a top portion and a bottom portion for later assembly of a hermitically sealed hard disk drive  
A hermetically sealed mobile hard disk drive that combines high storage capacity and performance with low power consumption and portable operation, including an integrated base substrate. One...
7266880 Method of making a monolithic magnetic read-while-write head apparatus  
A method for fabricating a multi-track thin-film magnetoresistive tape head with precisely-aligned read/write track-pairs fabricated on a monolithic substrate wafer is provided. The wafer is...
7264742 Method of planarizing a surface  
A method for removing at least a portion of a structure, such as a layer, film, or deposit, including ruthenium metal and/or ruthenium dioxide includes contacting the structure with a material...
7264641 Polishing pad comprising biodegradable polymer  
The invention is directed to a polishing pad for use in chemical-mechanical polishing comprising a biodegradable polymer. The biodegradable polymer comprises a repeat unit selected from the group...
7264542 Knife sharpening method and system  
A method and system are disclosed. The system may include a device for sharpening a convex edge on the blade of a knife. The device may include a resilient material and a plurality of abrasive...
7264541 Drywall corner sander  
An improved drywall corner sander is provided with an elongated body having opposite sides, and a pair of spaced apart braces extending between the sides. An axle is pivotally mounted between the...
7264540 Arrow blade sharpening apparatus  
The arrow blade sharpening apparatus is best suited for precision sharpening of arrow blades, Exacto® knife blades, and other like edges which require precision and fine honing. The transparent...
7264539 Systems and methods for removing microfeature workpiece surface defects  
Systems and methods for removing microfeature workpiece surface defects are disclosed. A method for processing a microfeature workpiece in accordance with one embodiment includes removing surface...
7264538 Method of removing a coating  
A method of removing at least a part of a thermal sprayed wear resistant coating on a gas turbine engine part includes grinding the thermal sprayed wear resistant coating with a superabrasive...
7264537 Methods for monitoring a chemical mechanical planarization process of a metal layer using an in-situ eddy current measuring system  
Methods are provided for monitoring a CMP process. An exemplary method comprises generating a plurality of thickness measurements of a metal layer using an in-situ eddy current measuring system....
7264536 Polishing pad with window  
A polishing layer of a polishing has a window member with a top surface positioned a predetermined distance below the polishing surface. A transparent layer can be positioned below the polishing...
7264535 Run-to-run control of backside pressure for CMP radial uniformity optimization based on center-to-edge model  
During planarization of wafers, the thickness of a layer of a wafer is measured at a number of locations, after the wafer has been planarized by chemical mechanical polishing. The thickness...
7263763 Planarization method for a structure having a first surface for etching and a second surface  
A method is provided for planarization of structures which minimizes step heights, reduces process steps, improves cleanliness, and provides increased ease of debond. Structures are placed with...
7261625 Polishing pad  
A single-layered polishing pad suitable for chemical mechanical polishing (CMP) of semiconductor wafers, etc., which attains excellent step height reduction and in-plane uniformity and is...
7261624 Protective cover for a hand-held cut-off machine  
A protective cover for a cutting wheel of a hand-held cut-off machine driven by an internal combustion engine has a circumferential wall and two opposed sidewalls adjoining the circumferential...
7261623 Wood floor sanding machine  
A power sanding machine ( 10 ) has three circumferentially spaced cogged belts ( 40 ) to drive three discs ( 52 ) rotatably mounted to an inner bowl ( 30 ) which is rotatably mounted to a housing (...
7261622 Multiple cutting edged sanding wheel  
An improved sanding wheel configured to rotate axially for sanding or polishing milled contours that will provide sharp edges and corners in the workpiece. The preferred sanding wheel has a...
7261621 Pad conditioner for chemical mechanical polishing apparatus  
A pad conditioner may include a surface having a first region including a portion having relatively irregular shaped and friable polishing particles, and a second region including a portion having...
7261620 Method and device for reprofiling railway wheels  
The present invention relates to a method for reprofiling wheel disks ( 7 ) or brake disks of a railway wheel or wheelset ( 6 ), rotatably mounted in bearing housings ( 9 ), by machining using a...
7261619 Method and apparatus for abrasive recycling and waste separation system  
The present invention provides a method of handling abrasive solids materials used in an abrasive cutting procedure which jets a high-pressure abrasive slurry through a nozzle ( 7 ) onto a work...
7261618 Device and method for abrading a wooden barrel  
A device for abrading a wooden barrel ( 13 ) includes a robot having elements ( 11, 17, 23 ) for loading a barrel ( 13 ), elements ( 29 a , 29 b , 33 a , 33 b ) for gripping and rotating the barrel...
7261617 Semiconductor wafer regenerating system and method  
A semiconductor wafer regenerating system is capable of easily and efficiently removing fabricating patterns formed on a semiconductor wafer to enable reuse of the semiconductor wafer. The system,...
7261616 Magnetorheological polishing devices and methods  
A method of polishing an object is disclosed. In one embodiment, the method comprises the steps of creating a polishing zone within a magnetorheological fluid; determining the characteristics of...
7260887 Apparatus for controlling the lapping of a slider based on an amplitude of a readback signal produced from an externally applied magnetic field  
The lapping of a slider is controlled based on an amplitude of a readback signal which is produced from an externally applied magnetic field. A lapping plate is used to lap a slider which includes...
7260884 Method of manufacturing a drum assembly associated with video tape machine  
A method of manufacturing a drum assembly associated with a digital betacam video tape machine is disclosed. The method includes providing a helical scan drum assembly having a stationary upper...
7258833 High-energy cascading of abrasive wear components  
In accordance with the present invention, a method for manufacturing tungsten carbide components is provided. The method includes forming a composite material out of tungsten carbide powder and...
7258708 Chemical mechanical polishing pad dresser  
CMP pad dressers and their methods of manufacture are disclosed. One aspect of the present invention provides a CMP pad dresser having improved superabrasive grit retention in a resin layer. The...
7258705 Abrasive article and methods of making same  
A porous abrasive article that allows air and dust particles to pass through. The abrasive article has a screen abrasive and a polymer netting with hooks. The screen abrasive has an abrasive layer...
7258602 Polishing pad having grooved window therein and method of forming the same  
A polishing pad having grooved window therein is provided. The polishing pad comprises a polishing layer and a window, wherein the polishing layer has at least one first groove therein and the...
7258601 Machining apparatus  
A machining apparatus, comprising: a mounting member to be rotationally driven; a tool support member mounted on the mounting member; and a fixing member, fixed to the mounting member, for fixing...
7258600 Vacuum-assisted pad conditioning system  
A method and apparatus for conditioning polishing pads that utilize an apertured conditioning disk for introducing operation-specific slurries, without the need for additional tooling, platens, and...
7258599 Polishing machine, workpiece supporting table pad, polishing method and manufacturing method of semiconductor device  
A pedestal pad (workpiece supporting table pad) is arranged on the top of a pedestal (workpiece supporting table) for temporarily placing and holding a pre-polished or post-polished wafer...
7258598 Polishing solution supply system, method of supplying polishing solution, apparatus for and method of polishing semiconductor substrate and method of manufacturing semiconductor device  
A first supply unit sprays and supplies abrasive slurry containing abrasive grains into a mixing unit. A second supply unit sprays and supplies additive into the mixing unit. A third supply unit...
7258597 Subsea abrasive jet cutting system and method of use  
An apparatus for cutting a material underwater is disclosed where the apparatus uses a mixture of abrasive material in a non-aspirated suspension mixed with a high pressure fluid, e.g. seawater. It...
Matches 601 - 650 out of 51843 < 6 7 8 9 10 11 12 13 14 15 16 17 18 19 20 >